⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL976139 | 0.87 | — | — | |
| SCHEMBL976733 | 0.85 | — | — | |
| SCHEMBL5768464 | 0.84 | — | — | |
| SCHEMBL3620558 | 0.83 | — | — | |
| SCHEMBL975586 | 0.79 | — | — | |
| SCHEMBL4276279 | 0.77 | — | — | |
| SCHEMBL975353 | 0.77 | — | — | |
| SCHEMBL647761 | 0.74 | — | — | |
| SCHEMBL976694 | 0.74 | — | — | |
| SCHEMBL3625126 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3240822-B1 | TERMINAL-FUNCTIONALIZED POLYMER AND RELATED METHODS | BRIDGESTONE CORP (JP) | 2023-07-26 | — | — | EP | disclosed |
| CN-112625246-B | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2023-01-10 | — | — | CN | disclosed |
| US-11111338-B2 | Terminal-functionalized polymer and related methods | BRIDGESTONE CORPORATION (JP) | 2021-09-07 | — | — | US | disclosed |
| CN-112625246-A | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2021-04-09 | — | — | CN | disclosed |
| CN-107428940-B | Terminally functionalized polymers and related methods | 株式会社普利司通 | 2020-12-15 | — | — | CN | disclosed |
| US-20200109242-A1 | Terminal-Functionalized Polymer And Related Methods | BRIDGESTONE CORPORATION (JP) | 2020-04-09 | — | — | US | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180002490-A1 | Terminal-Functionalized Polymer And Related Methods | BRIDGESTONE CORPORATION (JP) | 2018-01-04 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |