SCHEMBL976266

SCHEMBL976266

[CH2][CH]C[CH][CH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4665491 0.75
SCHEMBL7695669 0.71
SCHEMBL11820206 0.71
SCHEMBL2892536 0.71
SCHEMBL6862167 0.71
SCHEMBL7691346 0.66
SCHEMBL827400 0.66
SCHEMBL4664149 0.66
SCHEMBL15602752 0.66
SCHEMBL23908703 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527101-B Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component 信越化学工业株式会社 2024-04-23 CN disclosed
EP-3896114-B1 POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2023-10-18 EP disclosed
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-02-07 US disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
EP-3896114-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed
EP-3352281-B1 NON-AQUEOUS ELECTROLYTE SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ADEKA CORP (JP) 2021-08-11 EP disclosed
CN-108140887-B Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery 株式会社艾迪科 2021-03-12 CN disclosed
US-10734684-B2 Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery ADEKA CORPORATION (JP) 2020-08-04 US disclosed
US-20180226683-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROPLYTE SECONDARY BATTERY ADKEA CORPORATION (JP) 2018-08-09 US disclosed
EP-3352281-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Adeka Corporation (JP) 2018-07-25 EP disclosed
US-8475937-B2 Silicone composition and organic light-emitting diode DOW CORNING CORPORATION (US) 2013-07-02 US disclosed
EP-2262861-B1 SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE DOW CORNING (US) 2012-09-19 EP disclosed
US-20110017986-A1 Silicone Composition and Organic Light-Emitting Diode DOW CORNING CORPORATION 2011-01-27 US disclosed
EP-2262861-A1 SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE Dow Corning Corporation (US) 2010-12-22 EP disclosed
WO-2009120434-A1 SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE DOW CORNING CORPORATION (US) 2009-10-01 WO disclosed