⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11573562 | 0.81 | PTPRC (0.30) | — | |
| SCHEMBL11017612 | 0.80 | — | — | |
| SCHEMBL10360025 | 0.80 | — | — | |
| SCHEMBL2623627 | 0.78 | — | — | |
| SCHEMBL21820179 | 0.78 | PTPRC (0.31) | — | |
| SCHEMBL19068807 | 0.78 | PTPRC (0.30) | — | |
| SCHEMBL8937017 | 0.78 | PTPRC (0.30) | — | |
| SCHEMBL2623607 | 0.78 | — | — | |
| SCHEMBL823904 | 0.76 | PTPRC (0.35) | — | |
| SCHEMBL15982238 | 0.76 | PTPRC (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0126266-B1 | LOW STRIATION POSITIVE RESIST COMPOSITION | MicroSi, Inc. (a Delaware corporation) (US) | 1990-03-21 | — | — | EP | claimed |
| US-4526856-A | Diazoketone photosensitive compound, alkali soluble resin, cyclic ketone solvent, aliphatic alcohol solvent | ALLIED CORPORATION (US) | 1985-07-02 | — | — | US | claimed |
| EP-0126266-A2 | Low striation positive resist composition | MicroSi, Inc. (a Delaware corporation) (US) | 1984-11-28 | — | — | EP | claimed |
| US-11049812-B2 | Semiconductor devices and methods of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2021-06-29 | — | — | US | disclosed |
| US-20200286832-A1 | SEMICONDCUTOR DEVICES AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-09-10 | — | — | US | disclosed |
| US-10665545-B2 | Semiconductor devices, semiconductor packages and methods of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-05-26 | — | — | US | disclosed |
| US-20200091073-A1 | SEMICONDCUTOR DEVICES, SEMICONDCUTOR PACKAGES AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-03-19 | — | — | US | disclosed |
| US-5059513-A | Exposing naphthoquinone diazide sulfonic acid ester with actinic radiation; uniformity; high thermal stability and resolution | HOECHST CELANESE CORPORATION (US) | 1991-10-22 | — | — | US | disclosed |
| EP-0140273-B1 | POSITIVE PHOTORESIST COMPOSITIONS HAVING DEEP UV RESPONSE, PHOTOSENSITIVE ELEMENTS AND THERMALLY STABLE PHOTOCHEMICALLY IMAGED SYSTEMS CONTAINING SAME | HOECHST CELANESE CORPORATION (US) | 1991-09-11 | — | — | EP | disclosed |
| US-4857435-A | Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer | HOECHST CELANESE CORPORATION (US) | 1989-08-15 | — | — | US | disclosed |
| US-4526856-A | Diazoketone photosensitive compound, alkali soluble resin, cyclic ketone solvent, aliphatic alcohol solvent | ALLIED CORPORATION (US) | 1985-07-02 | — | — | US | disclosed |
| EP-0140273-A2 | Positive photoresist compositions having deep UV response, photosensitive elements and thermally stable photochemically imaged systems containing same | HOECHST CELANESE CORPORATION (US) | 1985-05-08 | — | — | EP | disclosed |
| EP-0126266-A2 | Low striation positive resist composition | MicroSi, Inc. (a Delaware corporation) (US) | 1984-11-28 | — | — | EP | disclosed |