Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27615 | 0.95 | TSHR (0.61) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL10877779 | 0.95 | TSHR (0.61) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL30018303 | 0.95 | TSHR (0.61) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL284717 | 0.95 | TSHR (0.61) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL5958589 | 0.95 | TSHR (0.61) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| Ammonia Solution, Strong SCHEMBL14915113 | 0.93 | TSHR (0.59) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL31614726 | 0.93 | TSHR (0.59) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| Hydrochloric Acid SCHEMBL18171320 | 0.93 | TSHR (0.59) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| Water SCHEMBL10623226 | 0.93 | TSHR (0.59) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 | |
| SCHEMBL8502652 | 0.93 | TSHR (0.59) | TSHRSMN1; SMN2ALDH1A1TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111333044-B | Nitric acid production system and nitric acid production method | 深圳市华星光电半导体显示技术有限公司 | 2021-12-03 | — | — | CN | claimed |
| CN-111333044-A | Nitric acid production system and nitric acid production method | 深圳市华星光电半导体显示技术有限公司 | 2020-06-26 | — | — | CN | claimed |
| CN-111333044-B | Nitric acid production system and nitric acid production method | 深圳市华星光电半导体显示技术有限公司 | 2021-12-03 | — | — | CN | disclosed |
| CN-111333044-A | Nitric acid production system and nitric acid production method | 深圳市华星光电半导体显示技术有限公司 | 2020-06-26 | — | — | CN | disclosed |
| US-5075459-A | Organosilicon compound | TOSHIBA SILICONE CO., LTD. (JP) | 1991-12-24 | — | — | US | disclosed |
| EP-0100913-A1 | Encapsulation of electronic components with poly(arylene sulfide) containing mercaptosilane | PHILLIPS PETROLEUM COMPANY (US) | 1984-02-22 | — | — | EP | disclosed |