⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15284609 | 1.00 | — | — | |
| SCHEMBL15284592 | 1.00 | — | — | |
| SCHEMBL1150 | 0.97 | — | — | |
| SCHEMBL23904 | 0.86 | — | — | |
| SCHEMBL449059 | 0.73 | — | — | |
| SCHEMBL15284658 | 0.69 | — | — | |
| SCHEMBL15284234 | 0.69 | — | — | |
| SCHEMBL15284632 | 0.65 | — | — | |
| SCHEMBL1865631 | 0.62 | — | — | |
| Fluoride SCHEMBL27979818 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3581609-B1 | ACRYLIC RESIN BIAXIALLY STRETCHED FILM AND METHOD FOR MANUFACTURING THE SAME | KURARAY CO (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-20190168493-A1 | MOLDED BODY COMPRISING ACRYLIC RESIN COMPOSITION | KURARAY CO., LTD. (JP) | 2019-06-06 | — | — | US | disclosed |
| EP-3476595-A1 | MOLDED BODY COMPRISING ACRYLIC RESIN COMPOSITION | Kuraray Co., Ltd. (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-3284784-A1 | METHACRYLIC RESIN COMPOSITION | Kuraray Co., Ltd. (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-20130260315-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-8288077-B2 | Chemically amplified resist composition and salt employed therein | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-16 | — | — | US | disclosed |
| US-20110020749-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-27 | — | — | US | disclosed |