SCHEMBL978669

SCHEMBL978669

O=Cc1cc2cccc3ccc4c5ccccc5c(C=O)c1c4c32

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.49
ERBB2 P04626 1/20 0.49
FYN P06241 1/20 0.49
MAOA P21397 1/20 0.49
ACHE P22303 1/20 0.49
AHR P35869 1/20 0.49
ALDH1A1 P00352 3/20 0.44
HPGD P15428 3/20 0.44
HSD17B10 Q99714 3/20 0.44
THRB P10828 1/20 0.44
ERN1 O75460 3/20 0.39
PADI4 Q9UM07 1/20 0.39
POLB P06746 2/20 0.36
PTPN1 P18031 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
HPRT1 P00492 1/20 0.34
MAPT P10636 2/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL548502 0.84 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL29616396 0.84 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL978670 0.81 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL548870 0.80 CYP1A2 (0.54) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL548370 0.79 CYP1A2 (0.47) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL8722964 0.79 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL548658 0.77 KMT2A (0.44) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL10562778 0.77 CYP1A2 (0.52) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL6587371 0.74 CYP1A2 (0.42) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL4850561 0.74 CYP1A2 (0.69) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed