SCHEMBL978975

SCHEMBL978975

OC1=CC(O)C(O)(O)C=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5180657 0.76 CHRNA7 (0.31)
SCHEMBL29807506 0.75
SCHEMBL7198026 0.69
SCHEMBL9296623 0.69
SCHEMBL9298211 0.69
SCHEMBL31327424 0.69
SCHEMBL4473305 0.63
SCHEMBL10896522 0.62
SCHEMBL3286088 0.58
SCHEMBL3286093 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101007804-B 1,3-benzodioxole-2,2-dicarboxylic acid derivatives and their preparation method and medicinal uses INST PHARM & TOXICOLOGY AMMS 2011-05-11 CN claimed
CN-101007804-A 1,3-benzodioxole-2,2-dicarboxylic acid derivatives and their preparation method and medicinal uses POISON MED INST PLA MED ACAD (CN) 2007-08-01 CN claimed
CN-1543334-A Oxidation hair dye agent comprising 3-aminophenol derivative and novel 3-aminophenol derivative P&G 2004-11-03 CN claimed
CN-119350286-A A series of multi-benzene ring photoinitiators and photoinitiator application thereof 湖北兴福电子材料股份有限公司 2025-01-24 CN disclosed
CN-116763672-A Preparation formula and method of air-oxidized single-agent hair dyeing product 佛山市喜妆化妆品有限公司 2023-09-19 CN disclosed
CN-109526241-B Solid electrolyte composition, sheet and battery, and related manufacturing method and polymer 富士胶片株式会社 2022-07-01 CN disclosed
CN-107429043-B Flame retardant resin for laminate and composite comprising phosphorus-containing flame retardant 朗盛解决方案美国公司 2020-12-22 CN disclosed
EP-2662727-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2019-08-14 EP disclosed
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 EP disclosed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed
CN-101007804-A 1,3-benzodioxole-2,2-dicarboxylic acid derivatives and their preparation method and medicinal uses POISON MED INST PLA MED ACAD (CN) 2007-08-01 CN disclosed
CN-1942825-A Resist composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-04-04 CN disclosed
US-20070059632-A1 Method of manufacturing a semiconductor device MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-03-15 US disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed
EP-1666970-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-06-07 EP disclosed
EP-0700981-B1 Photopolymerisable liquid crystals ROLIC AG (CH) 2000-12-27 EP disclosed
US-5593617-A Photochemically polymerizable liquid crystals HOFFMANN-LAROCHE INC. (US) 1997-01-14 US disclosed
EP-0700981-A2 Photopolymerisable liquid crystals F. HOFFMANN-LA ROCHE AG (CH) 1996-03-13 EP disclosed