⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29352382 | 1.00 | — | — | |
| Water SCHEMBL28006117 | 0.97 | — | — | |
| Ethane SCHEMBL27502526 | 0.97 | TSHR (0.53) | — | |
| Bromide SCHEMBL27923417 | 0.97 | — | — | |
| SCHEMBL6131755 | 0.97 | — | — | |
| Fluoride SCHEMBL4237285 | 0.97 | TSHR (0.53) | — | |
| SCHEMBL1314055 | 0.97 | — | — | |
| SCHEMBL18084181 | 0.97 | TSHR (0.53) | — | |
| Methyl Alcohol SCHEMBL6113311 | 0.94 | TSHR (0.50) | — | |
| 1,2-Dichlorobenzene SCHEMBL27486870 | 0.87 | TSHR (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2876 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121574107-A | Method for synthesizing aryl thiobenzothiazole compound based on cuprous chloride | 苏州大学 | 2026-02-27 | — | — | CN | claimed |
| EP-4684045-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | Versum Materials US, LLC (US) | 2026-01-28 | — | — | EP | claimed |
| CN-116425693-B | Preparation method of fluorine Lei Lana, novel crystal form of fluorine ralfinade, preparation method and application thereof | 洛阳惠中兽药有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-119684185-A | Method for preparing sulfonium salt by using functional ionic liquid | 大连天源基化学有限公司 | 2025-03-25 | — | — | CN | claimed |
| US-20250062392-A1 | SOLID ELECTROLYTE COMPOSITION, SOLID ELECTROLYTE LAYER, ELECTRODE, AND BATTERY | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2025-02-20 | — | — | US | claimed |
| CN-119346167-A | Catalytic system and method for synthesizing diaryl acetylene from calcium carbide and iodo aromatic hydrocarbon | 石河子大学 | 2025-01-24 | — | — | CN | claimed |
| CN-116178092-B | Preparation method of 1, 4-tetraphenyl-1, 3-butadiene and derivatives thereof | 苏州大学 | 2024-11-22 | — | — | CN | claimed |
| WO-2024215931-A1 | AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES | VERSUM MATERIALS US, LLC (US) | 2024-10-17 | — | — | WO | claimed |
| CN-118580275-A | Preparation method of chiral phosphoramide derivative | 华侨大学 | 2024-09-03 | — | — | CN | claimed |
| CN-118440003-A | Organic room-temperature phosphorescent material, and preparation method and application thereof | 天津师范大学 | 2024-08-06 | — | — | CN | claimed |
| EP-0841337-B1 | Substituted 7,12-dioxabenzo(a)anthracene derivatives, process for their preparation and pharmaceutical compositions containing them | ADIR (FR) | 2001-09-05 | — | — | EP | claimed |
| EP-0841337-A1 | Substituted 7,12-dioxabenzo(a)anthracene derivatives, process for their preparation and pharmaceutical compositions containing them | ADIR ET COMPAGNIE (FR) | 1998-05-13 | — | — | EP | claimed |
| CN-1014607-B | Process for preparing copoly arylene sulfide | EASTMAN KODAK CO (US) | 1991-11-06 | — | — | CN | claimed |
| EP-0451201-A1 | PREPARATION OF BIDENTATE LIGANDS | EASTMAN KODAK COMPANY (US) | 1991-10-16 | — | — | EP | claimed |
| US-4939309-A | REACTING ARYL HALIDE WITH NICKEL-ORGANOPHOSPHINE-ORGANOMETAL-LIC-BIDENTATE LIGAND CATALYST | EASTMAN KODAK COMPANY (US) | 1990-07-03 | — | — | US | claimed |
| WO-1990006930-A1 | PREPARATION OF BIDENTATE LIGANDS | EASTMAN KODAK COMPANY (US) | 1990-06-28 | — | — | WO | claimed |
| EP-0375576-A1 | Preparation of bidentate ligands | EASTMAN KODAK COMPANY (US) | 1990-06-27 | — | — | EP | claimed |
| CN-1032663-A | The preparation method of copoly (Arylene Sulfide) | EASTMAN KODAK CO (US) | 1989-05-03 | — | — | CN | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |