SCHEMBL9857544

SCHEMBL9857544

O=[N+]([O-])[O-].O=[N+]([O-])[O-].O=[N+]([O-])[O-].[Cs+].[H+].[H+]

nearest known ligand 0.67

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.67
KMT2A Q03164 2/20 0.67
CA5A P35218 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
TSHR P16473 3/20 0.39
ALDH1A1 P00352 3/20 0.39
TDP1 Q9NUW8 1/20 0.39
HIF1A Q16665 2/20 0.36
HPGD P15428 1/20 0.36
LMNA P02545 1/20 0.32
BLM P54132 1/20 0.32
HBB P68871 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9488786 1.00
SCHEMBL1221534 0.94
SCHEMBL9488141 0.94 MEN1 (0.75) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL9717626 0.94
SCHEMBL71957 0.94
SCHEMBL9645152 0.88
Silver SCHEMBL2253632 0.88 MEN1 (0.67) MEN1KMT2ACA5ACA5BTSHR
SCHEMBL11422313 0.88
SCHEMBL8581600 0.88
SCHEMBL5907912 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0255395-B1 CATALYST FOR PRODUCTION OF ALPHA,BETA-ETHYLENICALLY UNSATURATED MONOCARBOXYLIC ACID AMOCO CORPORATION (US) 1991-05-15 EP disclosed
EP-0400692-A1 Process for producing Si02 Sn02 mixed oxide AMOCO CORPORATION (US) 1990-12-05 EP disclosed
US-4845070-A CONDENSATION OF PROPIONIC ACID AND FORMALDEHYDE TO PRODUCE METHACRYLIC ACID AMOCO CORPORATION (US) 1989-07-04 US disclosed
EP-0255395-A1 Catalyst for production of alpha,beta-ethylenically unsaturated monocarboxylic acid AMOCO CORPORATION (US) 1988-02-03 EP disclosed
US-4214183-A DIELECTRIC CHARGE STORAGE LAYER CONTAINING RUBIDIUM OXIDE OR FRANCIUM OXIDE OWENS-ILLINOIS, INC. (US) 1980-07-22 US disclosed
US-4121133-A Dielectric for multiple gaseous discharge display/memory panel having improved voltage characteristics OWENS-ILLINOIS, INC. (US) 1978-10-17 US disclosed
US-4114064-A MULTIPLE GASEOUS DISCHARGE DISPLAY/MEMORY PANEL HAVING IMPROVED VOLTAGE CHARACTERISTICS OWENS-ILLINOIS, INC. (US) 1978-09-12 US disclosed
US-3932920-A MEMORY PANEL HAVING IMPROVED VOLTAGE CHARACTERISTICS OWENS-ILLINOIS, INC. (US) 1976-01-20 US disclosed