Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 2/20 | 0.42 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.42 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.42 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | STING1 | Q86WV6 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.31 |
| ▸ | MMP3 | P08254 | 1/20 | 0.31 |
| ▸ | MMP9 | P14780 | 1/20 | 0.31 |
| ▸ | MMP13 | P45452 | 1/20 | 0.31 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
| ▸ | HTR2C | P28335 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6386008 | 0.79 | GABRR1 (0.52) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL5514417 | 0.77 | SLC1A3 (0.48) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL1572883 | 0.77 | SLC1A3 (0.48) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL21052495 | 0.77 | GABRR1 (0.54) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL11590922 | 0.75 | SLC1A3 (0.46) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL9545517 | 0.75 | SLC1A3 (0.46) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL9650094 | 0.75 | SLC1A3 (0.46) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL21331046 | 0.74 | RNPEP (0.47) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL16140111 | 0.74 | SLC1A3 (0.50) | SLC1A3SLC1A2SLC1A1GABRR1CYP1A2 | |
| SCHEMBL17707908 | 0.72 | SLC1A1 (0.49) | SLC1A3SLC1A2SLC1A1CYP1A2MMP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250109242-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCINNAMIC ACID DERIVATIVE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-116547781-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-110850682-B | Positive photosensitive resin composition, insulating film, and image display device | 东友精细化工有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| WO-2023074777-A1 | ADDITIVE-CONTAINING COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-05-04 | — | — | WO | disclosed |
| WO-2022138863-A1 | COMPOSITION FOR FORMING GAS BARRIER FILM, GAS BARRIER FILM AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2022-06-30 | — | — | WO | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |