SCHEMBL98755

SCHEMBL98755

CC(O)O[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4392227 0.77
SCHEMBL9292 0.72
SCHEMBL7400438 0.69
SCHEMBL2553136 0.67
SCHEMBL1100377 0.67
SCHEMBL304750 0.67
SCHEMBL2555155 0.67
SCHEMBL249451 0.67
SCHEMBL514568 0.67
SCHEMBL227419 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 401 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116003328-A Diaryl hydantoin compounds 加利福尼亚大学董事会 2023-04-25 CN claimed
EP-2550240-B1 USE OF A COMB POLYMER TO IMPROVE THE PROCESSABILITY OF HYDRAULICALLY SETTING COMPOSITIONS SIKA TECH AG (CH) 2019-05-15 EP claimed
CN-104870559-B The polycarboxylic acid of epoxy resin is used for as dispersing agent SIKA技术股份公司 2019-02-15 CN claimed
US-10040722-B2 Additive for hydraulically setting systems with improved processing SIKA TECHNOLOGY AG (CH) 2018-08-07 US claimed
US-9617410-B2 Polycarboxylate ethers used as dispersing agents for epoxy resins SIKA TECHNOLOGY AG (CH) 2017-04-11 US claimed
EP-2917279-B1 POLYCARBOXYLATE ETHER AS DISPERSION AGENT FOR EPOXY RESINS SIKA TECH AG (CH) 2016-12-14 EP claimed
EP-3020706-A1 DIARYLTHIOHYDANTOIN COMPOUNDS USEFUL FOR THE TREATMENT OF A HYPERPROLIFERATIVE DISORDER THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2016-05-18 EP claimed
CN-102858711-B For having the additive of the hydraulically setting systems of the processibility of improvement SIKA TECHNOLOGY AG (CH) 2016-01-13 CN claimed
CN-102662306-B The manufacture method of photosensitive element, corrosion-resisting pattern formation method and printed circuit board (PCB) HITACHI CHEMICAL CO., LTD. (JP) 2015-11-25 CN claimed
US-20150284563-A1 POLYCARBOXYLATE ETHERS USED AS DISPERSING AGENTS FOR EPOXY RESINS SIKA TECHNOLOGY AG (CH) 2015-10-08 US claimed
WO-2005095395-A2 TETRAHYDRONAPHTHYRIDINE DERIVATIVES AS CHOLESTERYL ESTER TRANSFER PROTEIN INHIBITORS TANABE SEIYAKU CO., LTD. (JP) 2005-10-13 WO claimed
JP-2003500377-A 2003-01-07 JP claimed
EP-1181267-A1 HALOGEN COMPOUNDS Bayer Aktiengesellschaft (DE) 2002-02-27 EP claimed
WO-2000071500-A1 HALOGEN COMPOUNDS BAYER AKTIENGESELLSCHAFT (DE) 2000-11-30 WO claimed
US-5554738-A PRINTING TEXTILE, PAPER, LEATHER CIBA-GEIGY CORPORATION (US) 1996-09-10 US claimed
EP-0289458-B1 Anionic disazo dyes CIBA GEIGY AG (CH) 1994-02-02 EP claimed
EP-0321462-B1 LUBRICANT AND FUEL ADDITIVES DERIVED FROM O,O-DIALKYLDITHIOPHOSPHORIC ACID AND A NORBORNYL REACTANT The Lubrizol Corporation (US) 1993-03-17 EP claimed
EP-0290384-B1 ANIONIC DISAZO DYES CIBA-GEIGY AG (CH) 1992-12-16 EP claimed
EP-0290384-A2 Anionic disazo dyes CIBA-GEIGY AG (CH) 1988-11-09 EP claimed
EP-0289458-A2 Anionic disazo dyes CIBA-GEIGY AG (CH) 1988-11-02 EP claimed