⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16002517 | 0.88 | — | — | |
| SCHEMBL14905888 | 0.88 | — | — | |
| SCHEMBL16351117 | 0.79 | — | — | |
| SCHEMBL16002515 | 0.76 | — | — | |
| SCHEMBL18231792 | 0.73 | — | — | |
| SCHEMBL17263339 | 0.73 | — | — | |
| SCHEMBL17029366 | 0.73 | — | — | |
| SCHEMBL15500218 | 0.73 | — | — | |
| SCHEMBL9486157 | 0.71 | — | — | |
| SCHEMBL1505887 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9567501-B2 | Silicone pressure-sensitive adhesive composition having improved substrate adhesion and pressure-sensitive adhesive article | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20150240141-A1 | SILICONE PRESSURE-SENSITIVE ADHESIVE COMPOSITION HAVING IMPROVED SUBSTRATE ADHESION AND PRESSURE-SENSITIVE ADHESIVE ARTICLE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-27 | — | — | US | disclosed |
| US-8835535-B2 | Aqueous dispersions of silica for increasing early strength in cementitious preparations | EVONIK DEGUSSA GMBH (DE) | 2014-09-16 | — | — | US | disclosed |
| US-20120142803-A1 | METHOD FOR CURING A SILICONE RESIN COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
| US-20110251339-A1 | SOLVENTLESS RELEASER COMPOSITION FOR USE WITH SILICONE PRESSURE-SENSITIVE ADHESIVES AND RELEASE LINER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20070275316-A1 | ELECTROSTATIC IMAGE DEVELOPING TONER | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-7297365-B2 | Recorded matter, method of producing recorded matter, method for improving image fastness, image fastness-improving agent, image fastness improving kit, dispenser, and applicator | CANON KABUSHIKI KAISHA (JP) | 2007-11-20 | — | — | US | disclosed |