SCHEMBL9893554

SCHEMBL9893554

C=CC[Si](NC(C)C)(NC(C)C)NC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11453692 0.79
SCHEMBL3109925 0.79
SCHEMBL26255416 0.78
SCHEMBL3120020 0.77
SCHEMBL26255505 0.77
SCHEMBL25168590 0.77
SCHEMBL26255409 0.69
SCHEMBL232592 0.65 MEN1 (0.30)
SCHEMBL26255411 0.65 TSHR (0.30)
SCHEMBL25171956 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2463404-B1 METHOD FOR FORMING SIO2 FILM VERSUM MAT US LLC (US) 2019-10-23 EP claimed
US-8460753-B2 Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-06-11 US claimed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US disclosed
EP-2463404-B1 METHOD FOR FORMING SIO2 FILM VERSUM MAT US LLC (US) 2019-10-23 EP disclosed
US-8460753-B2 Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-06-11 US disclosed
US-20120148745-A1 Aminovinylsilane for CVD and ALD SiO2 Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-06-14 US disclosed
EP-2463404-A1 Aminovinylsilane for cvd and ald sio2 films Air Products and Chemicals, Inc. (US) 2012-06-13 EP disclosed