SCHEMBL9908973

SCHEMBL9908973

COC1(C)CCCCC1C

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.35
ALDH1A1 P00352 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24132083 1.00 MAPT (0.35) MAPTALDH1A1CYP3A4
SCHEMBL19337533 0.93
SCHEMBL8639792 0.83 MAPT (0.33) MAPT
SCHEMBL10357405 0.81 MAPT (0.32) MAPT
SCHEMBL11880098 0.79 MAPT (0.34) MAPT
SCHEMBL12630719 0.79 MAPT (0.31) MAPT
SCHEMBL8146184 0.79 MAPT (0.31) MAPT
SCHEMBL24483580 0.74 SLC6A4 (0.34)
SCHEMBL27705534 0.74 SLC6A4 (0.33)
SCHEMBL24129062 0.74 SLC6A4 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161246-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-25 US disclosed
US-8822138-B2 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-02 US disclosed
US-20120142195-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-07 US disclosed
CN-1241973-C Polyamide resin and its production process MITSUBISHI GAS CHEMICAL CO (JP) 2006-02-15 CN disclosed
CN-1432588-A Polyamide resin and its production process MITSUBISHI GAS CHEMICAL CO (JP) 2003-07-30 CN disclosed