⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11895539 | 0.77 | TSHR (0.38) | — | |
| SCHEMBL11895541 | 0.77 | TSHR (0.38) | — | |
| SCHEMBL1347202 | 0.74 | — | — | |
| SCHEMBL14514232 | 0.74 | — | — | |
| Water SCHEMBL27886695 | 0.73 | — | — | |
| SCHEMBL27811960 | 0.72 | — | — | |
| SCHEMBL527689 | 0.72 | — | — | |
| SCHEMBL2162633 | 0.72 | — | — | |
| SCHEMBL17922821 | 0.69 | — | — | |
| SCHEMBL4905647 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112645787-B | Method for preparing isoprene | 中国科学院大连化学物理研究所 | 2022-03-08 | — | — | CN | disclosed |
| CN-112645790-B | Preparation method of isoprene | 中国科学院大连化学物理研究所 | 2021-09-21 | — | — | CN | disclosed |
| CN-109562633-B | Coating composition for glossy ink-receptive media | 路博润先进材料公司 | 2021-07-23 | — | — | CN | disclosed |
| CN-112645790-A | Preparation method of isoprene | 中国科学院大连化学物理研究所 | 2021-04-13 | — | — | CN | disclosed |
| CN-112645787-A | Method for preparing isoprene | 中国科学院大连化学物理研究所 | 2021-04-13 | — | — | CN | disclosed |
| US-10597549-B2 | Coating composition for glossy ink receptive media | LUBRIZOL ADVANCED MATERIALS, INC. | 2020-03-24 | — | — | US | disclosed |
| CN-110383567-A | Electrolyte solution, electrochemical device, lithium ion secondary battery, and assembly | 大金工业株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-110313098-A | Electrolyte, electrochemical device, lithium ion secondary battery and component | 大金工业株式会社 | 2019-10-08 | — | — | CN | disclosed |
| US-20190194485-A1 | COATING COMPOSITION FOR GLOSSY INK RECEPTIVE MEDIA | LUBRIZOL ADVANCED MATERIALS, INC. | 2019-06-27 | — | — | US | disclosed |
| EP-3490806-A1 | COATING COMPOSITION FOR GLOSSY INK RECEPTIVE MEDIA | Lubrizol Advanced Materials, Inc. (US) | 2019-06-05 | — | — | EP | disclosed |
| WO-2010051293-A1 | DISPERSION OF HYBRID POLYURETHANE WITH OLEFIN-ACRYLIC COPOLYMERIZATION | LUBRIZOL ADVANCED MATERIALS, INC. (US) | 2010-05-06 | — | — | WO | disclosed |
| WO-2009082640-A1 | OLEFIN ACRYLATE EMULSION COPOLYMERIZATION | LUBRIZOL ADVANCED MATERIALS, INC. (US) | 2009-07-02 | — | — | WO | disclosed |
| WO-2009067384-A1 | VINYL CHLORIDE, ACRYLATE, AND URETHANE POLYMERS WITH INCREASED MOISTURE VAPOR PERMEABILITY AND STATIC DISSIPATIVE PROPERTIES | LUBRIZOL ADVANCED MATERIALS, INC. (US) | 2009-05-28 | — | — | WO | disclosed |
| US-20080153975-A1 | initiating polymerization of the monomers forming the vinyl polymer ( acrylic monomers ) by bulk or solution polymerization,and adding the nanoparticles ( silica, zno, ceria, alumina and clay ) to the reaction mass in which the vinyl polymer is formed; coatings, films; wear, chemical radiation resistant | LUBRIZOL ADVANCED MATERIALS, INC. (US) | 2008-06-26 | — | — | US | disclosed |
| EP-1858964-A1 | NANOPARTICLE/VINYL POLYMER COMPOSITES | Lubrizol Advanced Materials, Inc. (US) | 2007-11-28 | — | — | EP | disclosed |
| WO-2006099630-A1 | NANOPARTICLE/VINYL POLYMER COMPOSITES | LUBRIZOL ADVANCED MATERIALS, INC. (US) | 2006-09-21 | — | — | WO | disclosed |
| US-20040225052-A1 | Antistatic polymers, blends, and articles | NOVEON IP HOLDINGS CORP. | 2004-11-11 | — | — | US | disclosed |
| US-6794475-B1 | Antistatic polymers, blends, and articles | NOVEON IP HOLDINGS CORP. | 2004-09-21 | — | — | US | disclosed |
| EP-1299441-A2 | ANTISTATIC POLYMERS, BLENDS, AND ARTICLES | Noveon IP Holdings Corp. (US) | 2003-04-09 | — | — | EP | disclosed |
| WO-2002002657-A2 | ANTISTATIC POLYMERS, BLENDS, AND ARTICLES | NOVEON IP HOLDINGS CORP. (US) | 2002-01-10 | — | — | WO | disclosed |