Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | HMGCR | P04035 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.38 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.38 |
| ▸ | SI | P14410 | 1/20 | 0.38 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.38 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1536952 | 0.91 | HMGCR (0.43) | GAAHMGCRCHRM1TBXA2RADRA1A | |
| SCHEMBL28494 | 0.91 | — | — | |
| Hydrogen Peroxide SCHEMBL11424917 | 0.88 | HMGCR (0.48) | HMGCRCHRM1TBXA2RADRA1APIK3CD | |
| Bromide SCHEMBL31309745 | 0.88 | — | — | |
| Water SCHEMBL29974354 | 0.88 | — | — | |
| SCHEMBL8482096 | 0.88 | — | — | |
| Acetone SCHEMBL2784800 | 0.88 | HMGCR (0.41) | HMGCRCHRM1TBXA2RADRA1APIK3CD | |
| Ammonia Solution, Strong SCHEMBL9790221 | 0.88 | — | — | |
| Phosphine SCHEMBL15818790 | 0.88 | — | — | |
| Acetone SCHEMBL1782990 | 0.88 | HMGCR (0.41) | HMGCRCHRM1TBXA2RADRA1APIK3CD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 460 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024100181-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| WO-2024100183-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | claimed |
| CN-115746616-A | Surface-modified hollow silica particles and surface-modified hollow silica dispersion | 凯斯科技股份有限公司 | 2023-03-07 | — | — | CN | claimed |
| CN-108350303-B | Novel compositions and their use for modifying the surface of substrates | 默克专利有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-109628042-A | A kind of photo-crosslinking adhesive | 深圳日高胶带新材料有限公司 | 2019-04-16 | — | — | CN | claimed |
| US-10155879-B2 | Compositions and use thereof for modification of substrate surfaces | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2018-12-18 | — | — | US | claimed |
| CN-104536265-A | Photoresist composition | ZHEJIANG YONGTAI TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | claimed |
| EP-4399197-A1 | SELECTIVE SELF-ASSEMBLED MONOLAYERS VIA SPIN-COATING METHOD FOR USE IN DSA | Merck Patent GmbH (DE) | 2024-07-17 | — | — | EP | disclosed |
| CN-111837075-B | Negative super thick film photoresist | 默克专利股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-118302461-A | Neutral brush with adjustable polarity for self-assembly with block copolymer containing poly (styrene) and poly (methyl methacrylate) segments | 默克专利股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| US-20240219829-A1 | HYDROPHOBIC CROSSLINKABLE PINNING UNDERLAYERS WITH IMPROVED DRY ETCH CAPABILITIES FOR PATTERNING DIRECTED SELF-ASSEMBLY OF PS-B-PMMA TYPE BLOCK COPOLYMERS | MERCK PATENT GMBH (DE) | 2024-07-04 | — | — | US | disclosed |
| EP-4388021-A2 | DEVELOPMENT OF NOVEL HYDROPHILIC PINNING MAT | Merck Patent GmbH (DE) | 2024-06-26 | — | — | EP | disclosed |
| WO-2024100183-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | disclosed |
| US-4296010-A | Resin composition for cationic electrodepositing paints | KANSAI PAINT CO., LTD. (JP) | 1981-10-20 | — | — | US | disclosed |
| US-4287041-A | Process for electrodeposition of cationic resins | KANSAI PAINT CO., LTD. (JP) | 1981-09-01 | — | — | US | disclosed |
| US-4274989-A | Cationic electrodepositable resin composition | KANSAI PAINT CO., LTD. (JP) | 1981-06-23 | — | — | US | disclosed |
| US-4134866-A | Aqueous cationic coating from amine-epoxy adduct, polyamide, and semi-blocked polyisocyanate, acid salt | KANSAI PAINT COMPANY, LIMITED (JP) | 1979-01-16 | — | — | US | disclosed |
| US-4134865-A | Process for making aqueous cationic coating from amine-epoxy adduct, polyamide, and semiblocked polyisocyanate, acid salt, and product | KANSAI PAINT COMPANY, LIMITED (JP) | 1979-01-16 | — | — | US | disclosed |
| US-4036795-A | Aqueous cationic coating from amine-epoxy adduct, polyamide, and semiblocked polyisocyanate, acid salt | KANSAI PAINT CO., LTD. (JA) | 1977-07-19 | — | — | US | disclosed |
| US-3972845-A | Aqueous coating compositions comprising polycarboxylic acid resin, phenol resin and copper compound | KANSAI PAINT COMPANY, LTD. (JA) | 1976-08-03 | — | — | US | disclosed |