⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9924194 | 0.91 | — | — | |
| SCHEMBL47530 | 0.89 | HMGCR (0.35) | — | |
| SCHEMBL47571 | 0.88 | — | — | |
| SCHEMBL47514 | 0.88 | — | — | |
| SCHEMBL13557787 | 0.84 | — | — | |
| SCHEMBL18791237 | 0.81 | CHRM2 (0.36) | — | |
| SCHEMBL22236870 | 0.81 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL16744068 | 0.81 | — | — | |
| SCHEMBL9924193 | 0.80 | HMGCR (0.30) | — | |
| SCHEMBL19036982 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230137472-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20170184967-A1 | RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-9618842-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-8980524-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8497395-B2 | Compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-30 | — | — | US | disclosed |
| US-8487056-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-16 | — | — | US | disclosed |
| US-8440385-B2 | Positive resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-8415082-B2 | Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-09 | — | — | US | disclosed |
| US-20120329969-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | MATSUMIYA TASUKU (JP) | 2012-12-27 | — | — | US | disclosed |
| US-8252509-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-20120149916-A1 | NOVEL COMPOUND | CENTRAL GLASS CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110244392-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110236824-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110165512-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20110117491-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20100273105-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |