SCHEMBL993288

SCHEMBL993288

CCC(C)[N+](O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20333819 0.78 TSHR (0.35)
SCHEMBL2065110 0.76
SCHEMBL1961642 0.73
Water SCHEMBL319031 0.73
SCHEMBL2065874 0.73 TSHR (0.37)
Water SCHEMBL319958 0.71 TSHR (0.35)
Hydrochloric Acid SCHEMBL10624550 0.71 TSHR (0.35)
SCHEMBL907613 0.69 TSHR (0.38)
SCHEMBL18395249 0.67 TSHR (0.35)
Water SCHEMBL907833 0.67 TSHR (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6384179-B1 None US disclosed
CN-109385037-B Polyoxymethylene resin composition 旭化成株式会社 2022-10-04 CN disclosed
EP-3492450-B1 QUATERNARY AMMONIUM COMPOUND AND SUPPRESSION OF GENERATION OF VOLATILE ORGANIC COMPOUND FROM POLYACETAL UTILIZING SAME ASAHI CHEMICAL IND (JP) 2021-10-13 EP disclosed
US-10815190-B2 Quaternary ammonium compound, and agent for suppression of generation of volatile organic compound from polyacetal by use of the same ASAHI KASEI KABUSHIKI KAISHA (JP) 2020-10-27 US disclosed
EP-3492450-A1 QUATERNARY AMMONIUM COMPOUND AND SUPPRESSION OF GENERATION OF VOLATILE ORGANIC COMPOUND FROM POLYACETAL UTILIZING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2019-06-05 EP disclosed
US-20190161433-A1 QUATERNARY AMMONIUM COMPOUND, AND AGENT FOR SUPPRESSION OF GENERATION OF VOLATILE ORGANIC COMPOUND FROM POLYACETAL BY USE OF THE SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2019-05-30 US disclosed
US-10224127-B2 Polyacetal resin composition and molded article of the same ASAHI KASEI CHEMICALS CORPORATION (JP) 2019-03-05 US disclosed
US-20150294750-A1 POLYACETAL RESIN COMPOSITION AND MOLDED ARTICLE OF THE SAME ASAHI KASEI CHEMICALS CORPORATION (JP) 2015-10-15 US disclosed
US-9090770-B2 Polyacetal resin composition, method for producing the same, and molded article ASAHI KASEI CHEMICALS CORPORATION (JP) 2015-07-28 US disclosed
US-8765850-B2 Polyacetal resin composition and preparation process thereof ASAHI KASEI CHEMICALS CORPORATION (JP) 2014-07-01 US disclosed
US-20090137712-A1 ORAL WASH ASAHI KASEI CHEMICALS CORPORATION (JP) 2009-05-28 US disclosed
EP-1908991-A1 GEAR Asahi Kasei Chemicals Corporation (JP) 2008-04-09 EP disclosed
US-20070179231-A1 Polyacetal resin composition ASAHI KASEI CHEMICALS CORPORATION (JP) 2007-08-02 US disclosed
US-7088555-B2 Ramp for hard disc ASAHI KASEI CHEMICALS CORPORATION (JP) 2006-08-08 US disclosed
US-6977117-B2 Thermoplastic resin integrated structure ASAHI KASEI KABUSHIKI KAISHA (JP) 2005-12-20 US disclosed
US-20050018353-A1 Ramp for hard disc ASAHI KASEI KABUSHIKI KAISHA (JP) 2005-01-27 US disclosed
US-6388049-B1 MOLDING MATERIALS; NARROW MOLECULAR WEIGHT DISTRIBUTION ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-05-14 US disclosed
US-6384179-B2 COMPRISES 30-90% BY WEIGHT OF POLYACETAL COPOLYMER HAVING A MELT INDEX OF LESS THAN 1 G/10 MIN. AS COMPONENT A AND 70-10% BY WEIGHT OF POLYACETAL COPOLYMER HAVING A MELT INDEX OF 1-100 G/10 MIN. AS COMPONENT B; TOUGHNESS, CREEP RESISTANCE ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-05-07 US disclosed
US-20010034407-A1 Thermoplastic resin integrated structure ASAHI KASEI KABUSHIKI KAISHA (JP) 2001-10-25 US disclosed
US-20010007006-A1 Polyacetal resin composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2001-07-05 US disclosed