SCHEMBL9937211

SCHEMBL9937211

N[In]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2701509 0.58
SCHEMBL5575407 0.58
Hydrochloric Acid SCHEMBL221975 0.41
SCHEMBL2774955 0.41
SCHEMBL2002087 0.41
Hydrazine SCHEMBL2463370 0.41
Iodide SCHEMBL619550 0.41
SCHEMBL7168745 0.41
SCHEMBL3452183 0.41
SCHEMBL35987 0.41

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116510756-B High-entropy fluoride quantum dot nano-enzyme, preparation method and biochemical detection application thereof 广东工业大学 2023-10-03 CN claimed
CN-100428424-C Doped nitride film, doped oxide film and other doped films IBM (US) 2008-10-22 CN claimed
CN-1716548-A Doped nitride film, doped oxide film and other doped films IBM (US) 2006-01-04 CN claimed
EP-4617777-A1 SUBSTRATE PROCESSING METHOD, COMPOSITION FOR FORMING METAL-CONTAINING RESIST, METAL-CONTAINING RESIST, AND SUBSTRATE PROCESSING SYSTEM Tokyo Electron Limited (JP) 2025-09-17 EP disclosed
US-20250264805-A1 SUBSTRATE PROCESSING METHOD, COMPOSITION FOR FORMING METAL-CONTAINING RESIST, METAL-CONTAINING RESIST, AND SUBSTRATE PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2025-08-21 US disclosed
CN-120153326-A Substrate processing method, composition for forming metal-containing resist, and substrate processing system 东京毅力科创株式会社 2025-06-13 CN disclosed
WO-2024101166-A1 SUBSTRATE PROCESSING METHOD, COMPOSITION FOR FORMING METAL-CONTAINING RESIST, METAL-CONTAINING RESIST, AND SUBSTRATE PROCESSING SYSTEM 東京エレクトロン株式会社 2024-05-16 WO disclosed
CN-114028954-A Preparation method and application of PAN @ aminated defect indium-based metal organic framework composite nanofiber membrane 东莞理工学院 2022-02-11 CN disclosed
US-9296042-B2 Process for preparing a compostion of mixed particles containing elements from columns 13 and 15 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) 2016-03-29 US disclosed
CN-105347317-A New method for preparing indium nitride nano material UNIV JIANGSU TECHNOLOGY 2016-02-24 CN disclosed
EP-2651828-B1 PROCESS FOR PREPARING A COMPOSTION OF MIXED PARTICLES CONTAINING ELEMENTS FROM COLUMNS 13 AND 15 CENTRE NAT RECH SCIENT (FR) 2015-02-11 EP disclosed
US-20130309160-A1 PROCESS FOR PREPARING A COMPOSTION OF MIXED PARTICLES CONTAINING ELEMENTS FROM COLUMNS 13 AND 15 CENTRE NATIONAL DE AL RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) 2013-11-21 US disclosed
EP-2651828-A1 PROCESS FOR PREPARING A COMPOSTION OF MIXED PARTICLES CONTAINING ELEMENTS FROM COLUMNS 13 AND 15 Centre National De La Recherche Scientifique CNRS (FR) 2013-10-23 EP disclosed
WO-2012080425-A1 PROCESS FOR PREPARING A COMPOSTION OF MIXED PARTICLES CONTAINING ELEMENTS FROM COLUMNS 13 AND 15 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) 2012-06-21 WO disclosed
CN-100428424-C Doped nitride film, doped oxide film and other doped films IBM (US) 2008-10-22 CN disclosed
CN-1716548-A Doped nitride film, doped oxide film and other doped films IBM (US) 2006-01-04 CN disclosed