SCHEMBL9940075

SCHEMBL9940075

C=CC(=O)OC(C)C(C)(C)N

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.41
ALDH1A1 P00352 4/20 0.31
TP53 P04637 3/20 0.31
HIF1A Q16665 3/20 0.31
CYP3A4 P08684 2/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HPGD P15428 1/20 0.31
HSD17B10 Q99714 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL717362 0.98 TSHR (0.39) TSHRALDH1A1TP53HIF1ACYP3A4
Hydrochloric Acid SCHEMBL10621298 0.96 TSHR (0.38) TSHR
SCHEMBL9120513 0.88 TSHR (0.33) TSHR
SCHEMBL10787047 0.85 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9004562 0.83 TSHR (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL7085929 0.81 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL10936252 0.81 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23494254 0.79 TSHR (0.41) TSHRALDH1A1TP53HIF1ACYP3A4
Hydrochloric Acid SCHEMBL8779948 0.79 TSHR (0.37) TSHR
SCHEMBL5672879 0.79 TSHR (0.41) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11331939-B2 Recording media HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-05-17 US disclosed
US-20200180338-A1 RECORDING MEDIA HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2020-06-11 US disclosed
US-10543707-B2 Recording media HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2020-01-28 US disclosed
US-9558862-B2 Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition SHIN-ETSU POLYMER CO., LTD. (JP) 2017-01-31 US disclosed
EP-2868698-B1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE WHICH IS PROVIDED WITH ANTISTATIC FILM OBTAINED FROM CONDUCTIVE POLYMER COMPOSITION, AND PATTERN FORMING METHOD USING CONDUCTIVE POLYMER COMPOSITION SHINETSU POLYMER CO (JP) 2016-12-07 EP disclosed
EP-2701922-B1 RECORDING MEDIA HEWLETT PACKARD DEVELOPMENT CO (US) 2016-07-20 EP disclosed
US-20150140492-A1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE HAVING ANTISTATIC FILM FORMED FROM THE COMPOSITION, AND PATTERNING PROCESS USING THE COMPOSITION SHIN-ETSU POLYMER CO., LTD. (JP) 2015-05-21 US disclosed
EP-2868698-A1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE WHICH IS PROVIDED WITH ANTISTATIC FILM OBTAINED FROM CONDUCTIVE POLYMER COMPOSITION, AND PATTERN FORMING METHOD USING CONDUCTIVE POLYMER COMPOSITION Shin-Etsu Polymer Co. Ltd. (JP) 2015-05-06 EP disclosed
EP-2701922-A1 RECORDING MEDIA Hewlett-Packard Development Company, L.P. (US) 2014-03-05 EP disclosed
US-20140044897-A1 RECORDING MEDIA HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2014-02-13 US disclosed
WO-2012148404-A1 RECORDING MEDIA HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2012-11-01 WO disclosed
US-8202540-B1 Method for controlled production of ultrafine microparticles and nanoparticles ABBOTT GMBH & CO., KG (DE) 2012-06-19 US disclosed