SCHEMBL9944505

SCHEMBL9944505

CCC(C)(C)C(=O)OC(C)(C)C(=O)OC1C2CC3C(=O)OC1C3O2

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47507 0.92 HMGCR (0.35) HMGCR
SCHEMBL12216166 0.86 HMGCR (0.30) HMGCR
SCHEMBL12973963 0.84
SCHEMBL47489 0.83
SCHEMBL19880769 0.83
SCHEMBL15905717 0.82
SCHEMBL16591719 0.82
SCHEMBL16542521 0.82
SCHEMBL13609132 0.82 HMGCR (0.30) HMGCR
SCHEMBL14750828 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120148956-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed