SCHEMBL994590

SCHEMBL994590

O[C]1CCC1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL993368 0.76
SCHEMBL974915 0.74
SCHEMBL7733268 0.72
SCHEMBL6393719 0.70
SCHEMBL891012 0.70 TSHR (0.32)
SCHEMBL9237954 0.69
SCHEMBL6311729 0.67
SCHEMBL17675677 0.67
SCHEMBL21436319 0.67
SCHEMBL1071315 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230418161-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-12-28 US disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11762292-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-09-19 US disclosed
US-11500291-B2 Underlying coating compositions for use with photoresists ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2022-11-15 US disclosed
CN-115058175-A Coating compositions for use with overcoated photoresists 罗门哈斯电子材料有限责任公司 2022-09-16 CN disclosed
CN-109143783-B Coating compositions for use with overcoated photoresists 罗门哈斯电子材料韩国有限公司 2022-04-29 CN disclosed
CN-109541886-B Antireflective compositions, methods of use thereof, and coated substrates 罗门哈斯电子材料韩国有限公司 2022-04-26 CN disclosed
US-11262656-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2022-03-01 US disclosed
US-11086220-B2 Underlayer coating compositions for use with photoresists ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2021-08-10 US disclosed
CN-106814543-B Coating compositions for use with overcoated photoresists 罗门哈斯电子材料韩国有限公司 2021-03-23 CN disclosed
US-20130004901-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-01-03 US disclosed
US-20130004893-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-01-03 US disclosed
EP-2472328-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials LLC (US) 2012-07-04 EP disclosed
EP-2472329-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials LLC (US) 2012-07-04 EP disclosed
US-20110033800-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-10 US disclosed
US-20110033801-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-10 US disclosed
EP-2275490-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2011-01-19 EP disclosed
EP-2258691-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-08 EP disclosed
CN-101374844-A Pyrrolopyridazinone compound UBE INDUSTRIES (JP) 2009-02-25 CN disclosed
US-6388044-B1 THERMOSETTING POLYETHER; CROSSLINKING BY HEATING SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-05-14 US disclosed