Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL552728 | 0.82 | TSHR (0.38) | TSHRTDP1 | |
| SCHEMBL12308958 | 0.78 | CA1 (0.32) | CA1CA2CA7CA13EPHX1 | |
| SCHEMBL13955083 | 0.74 | TSHR (0.32) | TSHRTDP1 | |
| SCHEMBL18680877 | 0.74 | CES1 (0.31) | — | |
| SCHEMBL4122575 | 0.72 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL17865329 | 0.72 | — | — | |
| SCHEMBL4119887 | 0.71 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL14468630 | 0.70 | — | — | |
| SCHEMBL18685262 | 0.70 | — | — | |
| SCHEMBL16794867 | 0.70 | CA1 (0.36) | CA1CA2CA7CA13EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20130011619-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |