SCHEMBL9963697

SCHEMBL9963697

C=Cc1ccc(C(=O)OCCOS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
TDP1 Q9NUW8 3/20 0.33
SNCA P37840 1/20 0.33
STS P08842 3/20 0.32
ADRB2 P07550 1/20 0.31
ADRB1 P08588 1/20 0.31
ADRB3 P13945 1/20 0.31
TAS1R3 Q7RTX0 1/20 0.31
TAS1R1 Q7RTX1 1/20 0.31
ESR1 P03372 2/20 0.31
ESR2 Q92731 1/20 0.31
ALDH1A1 P00352 1/20 0.31
CHRM1 P11229 1/20 0.31
TSHR P16473 1/20 0.31
SLC6A2 P23975 1/20 0.31
KDR P35968 1/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742182 0.89 HRH3 (0.32) CA1CA2
SCHEMBL2742178 0.83 STS (0.37) SNCASTSADRB2ADRB1ADRB3
SCHEMBL18499580 0.82 CA1 (0.39) CA1CA2TDP1ALDH1A1NPC1
SCHEMBL10264910 0.81 STS (0.36) CA1CA2TDP1SNCASTS
SCHEMBL22336425 0.81 TDP1 (0.36) CA1CA2TDP1SNCASTS
SCHEMBL2742175 0.80 KMT2A (0.40) CA1CA2TDP1STSALDH1A1
SCHEMBL26488823 0.79 SNCA (0.39) CA1CA2TDP1SNCASTS
SCHEMBL2742172 0.79 PTPN1 (0.38) CA1CA2TDP1ALDH1A1L3MBTL1
SCHEMBL2742217 0.78 STS (0.41) CA1CA2STSESR1ALDH1A1
SCHEMBL26417020 0.76 SNCA (0.49) CA1CA2TDP1SNCATAS1R3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052590-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20120156618-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-21 US disclosed