SCHEMBL9963786

SCHEMBL9963786

C=C(C)C(=O)NCCc1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NS(C)(=O)=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
STS P08842 3/20 0.43
SMN1; SMN2 Q16637 1/20 0.38
PPARA Q07869 1/20 0.36
PLAAT3 P53816 3/20 0.35
PLAAT5 Q96KN8 3/20 0.35
PLAAT2 Q9NWW9 3/20 0.35
PLAAT4 Q9UL19 3/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
ABCG2 Q9UNQ0 1/20 0.34
ACACB O00763 1/20 0.34
CA1 P00915 3/20 0.34
CA2 P00918 3/20 0.34
ALDH1A1 P00352 3/20 0.34
CA12 O43570 2/20 0.34
CA9 Q16790 2/20 0.34
CACNA1B Q00975 1/20 0.33
APBA1 Q02410 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105141 0.92 STS (0.43) STSSMN1; SMN2PLAAT3PLAAT5PLAAT2
SCHEMBL1436768 0.91 STS (0.42) STSSMN1; SMN2PLAAT3PLAAT5PLAAT2
SCHEMBL2742220 0.87 STS (0.46) STSSMN1; SMN2PLAAT3PLAAT5PLAAT2
SCHEMBL17409241 0.84 GAA (0.51) STSPPARAKMT2ACA1CA2
SCHEMBL2742227 0.76 KMT2A (0.40) STSMEN1KMT2AALDH1A1
SCHEMBL16638142 0.76 GAA (0.51) STSSMN1; SMN2KMT2ACA1CA2
SCHEMBL9963796 0.76 STS (0.46) STSSMN1; SMN2PPARAKMT2ACA1
SCHEMBL12039869 0.75 EGFR (0.34) STSSMN1; SMN2PPARACA1CA2
SCHEMBL15450670 0.75 KMT2A (0.39) STSMEN1KMT2AALDH1A1
SCHEMBL15426664 0.74 POLB (0.43) STSSMN1; SMN2MEN1KMT2ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052590-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20120156618-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-21 US disclosed