Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23302395 | 0.73 | — | — | |
| SCHEMBL1050458 | 0.73 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL8958368 | 0.73 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL1049087 | 0.73 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL8958437 | 0.73 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL5533086 | 0.73 | CA1 (0.31) | CA1CA2CA9 | |
| SCHEMBL16588418 | 0.69 | — | — | |
| SCHEMBL22580530 | 0.67 | — | — | |
| SCHEMBL8853060 | 0.67 | — | — | |
| SCHEMBL5028794 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 154 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9617396-B2 | Method for in-situ synthesis of silicon nanoparticles | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2017-04-11 | — | — | US | claimed |
| EP-2817361-B1 | PROCESS FOR IN-SITU SYNTHESIS OF SILICA NANOPARTICULES | Commissariat à l'énergie atomique et aux énergies alternatives (FR) | 2016-11-02 | — | — | EP | claimed |
| US-20150031794-A1 | Method For In-Situ Synthesis Of Silicon Nanoparticles | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2015-01-29 | — | — | US | claimed |
| EP-2817361-A1 | METHOD FOR IN-SITU SYNTHESIS OF SILICON NANOPARTICLES | Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR) | 2014-12-31 | — | — | EP | claimed |
| WO-2013124795-A1 | METHOD FOR IN-SITU SYNTHESIS OF SILICON NANOPARTICLES | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2013-08-29 | — | — | WO | claimed |
| JP-4662718-B2 | — | — | 2011-03-30 | — | — | JP | claimed |
| US-7445953-B2 | Low temperature curable materials for optical applications | HONEYWELL INTERNATIONAL INC. (US) | 2008-11-04 | — | — | US | claimed |
| US-7381441-B2 | Low metal porous silica dielectric for integral circuit applications | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-03 | — | — | US | claimed |
| US-7381442-B2 | Porogens for porous silica dielectric for integral circuit applications | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-03 | — | — | US | claimed |
| WO-2008014630-A1 | PHOTOSENSITIVE MATERIALS AND USES THEREOF | HONEYWELL INTERNATIONAL, INC. (US) | 2008-02-07 | — | — | WO | claimed |
| JP-2005522878-A | — | — | 2005-07-28 | — | — | JP | claimed |
| US-20050136687-A1 | Porous silica dielectric having improved etch selectivity towards inorganic anti-reflective coating materials for integrated circuit applications, and methods of manufacture | HONEYWELL INTERNATIONAL INC | 2005-06-23 | — | — | US | claimed |
| US-20050123735-A1 | Porogens for porous silica dielectric for integral circuit applications | HONEYWELL INTERNATIONAL INC | 2005-06-09 | — | — | US | claimed |
| US-20050106376-A1 | Low metal porous silica dielectric for integral circuit applications | HONEYWELL INTERNATIONAL INC | 2005-05-19 | — | — | US | claimed |
| WO-2003088343-A1 | NEW POROGENS FOR POROUS SILICA DIELECTRIC FOR INTEGRAL CIRCUIT APPLICATIONS | HONEYWELL INTERNATIONAL, INC. (US) | 2003-10-23 | — | — | WO | claimed |
| WO-2003088344-A1 | LOW METAL POROUS SILICA DIELECTRIC FOR INTEGRAL CIRCUIT APPLICATIONS | HONEYWELL INTERNATIONAL, INC. (US) | 2003-10-23 | — | — | WO | claimed |
| EP-1327260-A2 | SIMPLIFIED METHOD TO PRODUCE NANOPOROUS SILICON-BASED FILMS | Honeywell International Inc. (US) | 2003-07-16 | — | — | EP | claimed |
| US-20030077918-A1 | Simplified method to produce nanoporous silicon-based films | WU HUI-JUNG (US) | 2003-04-24 | — | — | US | claimed |
| US-6495479-B1 | COATING WITH SUCH AS TETRAACETOXYSILANE AND A POROGEN, AGING OR CONDENSING IN PRESENCE OF WATER AND HEATING THE GELLED FILM | HONEYWELL INTERNATIONAL, INC. | 2002-12-17 | — | — | US | claimed |
| WO-2001086709-A2 | SIMPLIFIED METHOD TO PRODUCE NANOPOROUS SILICON-BASED FILMS | HONEYWELL INTERNATIONAL INC. (US) | 2001-11-15 | — | — | WO | claimed |