Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.52 |
| ▸ | ADRA2A | P08913 | 3/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.48 |
| ▸ | TACR2 | P21452 | 2/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | SHBG | P04278 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.48 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.48 |
| ▸ | HTR2C | P28335 | 1/20 | 0.48 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.48 |
| ▸ | TST | Q16762 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16114597 | 0.89 | ESR1 (0.59) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL12043854 | 0.83 | ESR1 (0.52) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL16249923 | 0.83 | ESR1 (0.42) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL10098408 | 0.83 | ESR1 (0.64) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL8530805 | 0.81 | CYP1A2 (0.46) | ALDH1A1ACHEKMT2AMEN1TAAR1 | |
| SCHEMBL2600042 | 0.80 | ESR1 (0.60) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL25039038 | 0.79 | TAAR1 (0.45) | ALDH1A1KDM4ELMNACYP2C19TAAR1 | |
| SCHEMBL7253631 | 0.78 | ESR1 (0.56) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL11134725 | 0.77 | ESR1 (0.54) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 | |
| SCHEMBL31589391 | 0.77 | ESR1 (0.54) | ESR1ESR2ADRA2ASLC6A2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334203-B2 | Interconnect structure and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120301980-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-29 | — | — | US | disclosed |
| US-20120252204-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-10-04 | — | — | US | disclosed |
| US-20120231622-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-20120161296-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-28 | — | — | US | disclosed |
| US-8202783-B2 | Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-20110304053-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-15 | — | — | US | disclosed |
| US-7919225-B2 | Photopatternable dielectric materials for BEOL applications and methods for use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-04-05 | — | — | US | disclosed |
| US-20110074044-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-31 | — | — | US | disclosed |
| US-20100319971-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH IMPROVED PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-23 | — | — | US | disclosed |
| US-20100314767-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-16 | — | — | US | disclosed |
| US-20090291389-A1 | PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | disclosed |