⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hexamethylbenzene SCHEMBL443295 | 0.87 | — | — | |
| Hexamethylbenzene SCHEMBL38513 | 0.80 | — | — | |
| Hexamethylbenzene SCHEMBL27808586 | 0.80 | — | — | |
| Hexamethylbenzene SCHEMBL28055272 | 0.80 | — | — | |
| Hexamethylbenzene SCHEMBL6945522 | 0.80 | — | — | |
| Hexamethylbenzene SCHEMBL114857 | 0.74 | RXFP1 (0.33) | — | |
| SCHEMBL5700238 | 0.74 | — | — | |
| Hexamethylbenzene SCHEMBL7511606 | 0.71 | — | — | |
| Hexamethylbenzene SCHEMBL9419367 | 0.68 | RXFP1 (0.31) | — | |
| Hexamethylbenzene SCHEMBL10608743 | 0.68 | RXFP1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115124817-A | Resin composition | 味之素株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-113637288-A | Resin composition | 味之素株式会社 | 2021-11-12 | — | — | CN | disclosed |
| CN-106047173-B | Antifouling composition | 佐敦集团 | 2020-12-11 | — | — | CN | disclosed |
| CN-111851085-A | Foamed resin layer and synthetic leather | 本田技研工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-104981760-B | display device and laminated optical film | 三井化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-105102205-B | Polyester film and method for producing same | 富士胶片株式会社 | 2017-11-03 | — | — | CN | disclosed |
| CN-105189106-B | Laminated body | 三井化学株式会社 | 2017-10-27 | — | — | CN | disclosed |
| CN-104822778-B | Antifouling coating composition | 佐敦公司 | 2017-10-03 | — | — | CN | disclosed |
| CN-105131541-B | Polymer piezoelectric material, and manufacturing method thereof | 三井化学株式会社 | 2017-05-24 | — | — | CN | disclosed |
| CN-104203815-B | Surface-treated carbon nanotube and resin composition | 旭化成株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-104066789-A | Thermoplastic resin composition and method for producing thermoplastic resin composition | TORAY INDUSTRIES | 2014-09-24 | — | — | CN | disclosed |
| CN-103797586-A | Solar cell backsheet and solar cell module | FUJI PHOTO FILM CO LTD | 2014-05-14 | — | — | CN | disclosed |
| CN-103476863-A | Polyester film, solar cell backsheet using same, and manufacturing method for polyester film | FUJI PHOTO FILM CO LTD | 2013-12-25 | — | — | CN | disclosed |
| CN-103430321-A | Polymer sheet for solar cell, process for production thereof, solar cell backsheet, and solar cell module | FUJI PHOTO FILM CO LTD | 2013-12-04 | — | — | CN | disclosed |
| EP-2585537-A2 | COATING HAVING IMPROVED HYDROLYTIC RESISTANCE | Honeywell International, Inc. (US) | 2013-05-01 | — | — | EP | disclosed |
| CN-103038286-A | Coating having improved hydrolytic resistance | HONEYWELL INT INC | 2013-04-10 | — | — | CN | disclosed |
| WO-2011163179-A2 | COATING HAVING IMPROVED HYDROLYTIC RESISTANCE | HONEYWELL INTERNATIONAL INC. (US) | 2011-12-29 | — | — | WO | disclosed |
| US-20110315223-A1 | COATING HAVING IMPROVED HYDROLYTIC RESISTANCE | HONEYWELL INTERNATIONAL INC. (US) | 2011-12-29 | — | — | US | disclosed |
| CN-1957024-A | Particle with rough surface and process for producing the same | NISSHIN SPINNING (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1957023-A | Particle with rough surface for plating or vapor deposition | NISSHIN SPINNING (JP) | 2007-05-02 | — | — | CN | disclosed |