⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3364405 | 0.77 | GRIN2D (0.31) | — | |
| SCHEMBL791395 | 0.76 | — | — | |
| SCHEMBL14493743 | 0.73 | — | — | |
| SCHEMBL1957348 | 0.71 | MEN1 (0.32) | — | |
| SCHEMBL3420118 | 0.68 | NQO1 (0.50) | — | |
| SCHEMBL39444 | 0.67 | TSHR (0.57) | — | |
| Formaldehyde SCHEMBL27801540 | 0.67 | TSHR (0.47) | — | |
| SCHEMBL16276536 | 0.65 | GRIN2D (0.39) | — | |
| SCHEMBL11860409 | 0.64 | GRIN2D (0.38) | — | |
| SCHEMBL25403085 | 0.63 | TSHR (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2530524-B1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL CORP (JP) | 2019-05-29 | — | — | EP | disclosed |
| EP-2397507-B1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2017-09-20 | — | — | EP | disclosed |
| US-9219123-B2 | Method of producing a nitride semiconductor crystal with precursor containing carbon and oxygen, and nitride semiconductor crystal and semiconductor device made by the method | SHARP KABUSHIKI KAISHA (JP) | 2015-12-22 | — | — | US | disclosed |
| US-8912295-B2 | Long chain alkylene group-containing epoxy compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-8778597-B2 | Long-chain alkylene-containing curable epoxy resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20140145202-A1 | NITRIDE SEMICONDUCTOR CRYSTAL | SHARP KABUSHIKI KAISHA (JP) | 2014-05-29 | — | — | US | disclosed |
| US-8722311-B2 | Positive resist composition and method for producing microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20120308890-A1 | CATHODE ACTIVE MATERIAL AND LITHIUM ION RECHARGEABLE BATTERY USING THE MATERIAL | HITACHI MAXELL ENERGY, LTD. | 2012-12-06 | — | — | US | disclosed |
| EP-2530524-A1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530098-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120295199-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20110319589-A1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |
| EP-0794254-B1 | Process for production of secretory kex2 derivatives | ASUBIO PHARMA CO LTD (JP) | 2008-10-01 | — | — | EP | disclosed |