⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11694262 | 0.71 | — | — | |
| SCHEMBL2744703 | 0.68 | — | — | |
| SCHEMBL13769865 | 0.67 | — | — | |
| SCHEMBL1052060 | 0.67 | — | — | |
| SCHEMBL3955331 | 0.66 | CA1 (0.39) | — | |
| SCHEMBL9833419 | 0.66 | KMT2A (0.48) | — | |
| SCHEMBL9833413 | 0.66 | KMT2A (0.48) | — | |
| SCHEMBL3955362 | 0.66 | CA1 (0.39) | — | |
| SCHEMBL3957270 | 0.66 | CA1 (0.39) | — | |
| SCHEMBL15127465 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2530524-B1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL CORP (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-10088612-B2 | Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof | CHI MEI CORPORATION (TW) | 2018-10-02 | — | — | US | disclosed |
| EP-2397507-B1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2017-09-20 | — | — | EP | disclosed |
| US-9568823-B2 | Photosensitive resin composition for color filter and uses thereof | CHI MEI CORPORATION (TW) | 2017-02-14 | — | — | US | disclosed |
| US-20160139309-A1 | ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER CONTAINING THE SAME AND USES THEREOF | CHI MEI CORPORATION (TW) | 2016-05-19 | — | — | US | disclosed |
| US-20160077428-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF | CHI MEI CORPORATION (TW) | 2016-03-17 | — | — | US | disclosed |
| US-8912295-B2 | Long chain alkylene group-containing epoxy compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-8778597-B2 | Long-chain alkylene-containing curable epoxy resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8722311-B2 | Positive resist composition and method for producing microlens | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| EP-2530524-A1 | POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| EP-2530098-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120295199-A1 | LONG-CHAIN ALKYLENE-CONTAINING CURABLE EPOXY RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20110319589-A1 | LONG CHAIN ALKYLENE GROUP-CONTAINING EPOXY COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |