⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7062360 | 1.00 | — | — | |
| SCHEMBL18073184 | 0.74 | — | — | |
| SCHEMBL16926958 | 0.69 | — | — | |
| SCHEMBL7359273 | 0.66 | — | — | |
| SCHEMBL8183864 | 0.66 | — | — | |
| SCHEMBL10853071 | 0.66 | — | — | |
| SCHEMBL8183867 | 0.66 | — | — | |
| SCHEMBL11037905 | 0.66 | — | — | |
| SCHEMBL1301719 | 0.64 | — | — | |
| SCHEMBL601401 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035371-A1 | COMPOUNDS USEFUL IN HIV THERAPY | GLAXOSMITHKLINE INTELLECTUAL PROPERTY (NO.2) LIMITED (GB) | 2026-02-05 | — | — | US | disclosed |
| US-12240853-B2 | Compounds useful in HIV therapy | GLAXOSMITHKLINE INTELLECTUAL PROPERTY (NO.2) LIMITED (GB) | 2025-03-04 | — | — | US | disclosed |
| US-20240218009-A1 | NOVEL FORMS OF CYCLIC DINUCLEOTIDE COMPOUNDS | MERCK SHARP & DOHME LLC (US) | 2024-07-04 | — | — | US | disclosed |
| US-20240199680-A1 | SYNTHESIS OF FLUORINATED CYCLIC DINUCLEOTIDES | MERCK SHARP & DOHME LLC (US) | 2024-06-20 | — | — | US | disclosed |
| US-20240182473-A1 | COMPOUNDS USEFUL IN HIV THERAPY | GLAXOSMITHKLINE INTELLECTUAL PROPERTY DEVELOPMENT LIMITED (GB) | 2024-06-06 | — | — | US | disclosed |
| US-20240182511-A1 | NOVEL FORMS OF CYCLIC DINUCLEOTIDE COMPOUNDS | MERCK SHARP & DOHME LLC (US) | 2024-06-06 | — | — | US | disclosed |
| US-20230387464-A1 | Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery | MU IONIC SOLUTIONS CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230387464-A1 | Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery | MU IONIC SOLUTIONS CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230303619-A1 | DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230303619-A1 | DEPROTECTION METHOD AND RESIN REMOVAL METHOD IN SOLID-PHASE REACTION FOR PEPTIDE COMPOUND OR AMIDE COMPOUND, AND METHOD FOR PRODUCING PEPTIDE COMPOUND | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20120034779-A1 | APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE | SHIMURA SATORU (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20110184133-A1 | ACTIVATING SUPPORTS BASED ON PHOSPHONIUM COMPLEXES | TOTAL PETROCHEMICALS RESEARCH FELUY (BE) | 2011-07-28 | — | — | US | disclosed |
| US-20110120650-A1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7902077-B2 | Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas | TOKYO ELECTRON LIMITED (JP) | 2011-03-08 | — | — | US | disclosed |
| US-20110053375-A1 | METHOD FOR PROCESSING AMORPHOUS CARBON FILM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE METHOD | TOKYO ELECTRON LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110009582-A1 | Preparation of Activating Supports | TOTAL PETROCHEMICALS RESEARCH FELUY (BE) | 2011-01-13 | — | — | US | disclosed |
| US-20100243999-A1 | ORGANIC ELECTRONIC DEVICE, ORGANIC ELECTRONIC DEVICE MANUFACTURING METHOD, ORGANIC ELECTRONIC DEVICE MANUFACTURING APPARATUS, SUBSTRATE PROCESSING SYSTEM, PROTECTION FILM STRUCTURE AND STORAGE MEDIUM WITH CONTROL PROGRAM STORED THEREIN | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20090286399-A1 | Substrate Processing Method and Storage Medium | TOKYO ELECTRON LIMITED (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20080057728-A1 | Process For Fabricating Semiconductor Device | TOKYO ELECTRON LIMITED (JP) | 2008-03-06 | — | — | US | disclosed |
| US-20070077768-A1 | Substrate processing method | TOKYO ELECTRON LIMITED | 2007-04-05 | — | — | US | disclosed |