SCHEMBL10013071

SCHEMBL10013071

O=C(O)C1=CC=CC2=C(C(=O)O)C=CC=CC2=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6285742 0.77
SCHEMBL4552436 0.76
SCHEMBL6323930 0.70
SCHEMBL6455224 0.69
SCHEMBL11580679 0.66 TSHR (0.33)
SCHEMBL11580681 0.66 TSHR (0.33)
SCHEMBL514533 0.63 TSHR (0.35)
SCHEMBL514534 0.63 TSHR (0.35)
SCHEMBL27810971 0.63
SCHEMBL15330778 0.62 TP53 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2479199-B1 POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING SAME DAINIPPON INK & CHEMICALS (JP) 2017-07-19 EP disclosed
US-8946374-B2 Polyether ester composition, polyurethane resin composition, and optical material using the same DIC CORPORATION (JP) 2015-02-03 US disclosed
EP-2479199-A1 POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING SAME DIC Corporation (JP) 2012-07-25 EP disclosed
US-20120172567-A1 POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING THE SAME DIC CORPORATION (JP) 2012-07-05 US disclosed