SCHEMBL10016092

SCHEMBL10016092

COc1ccc(C(=O)Oc2ccc(NC(=O)c3ccc(N)cc3)cc2)cc1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 11/20 0.69
NPC1 O15118 10/20 0.69
SMN1; SMN2 Q16637 5/20 0.69
TP53 P04637 4/20 0.69
ALOX15 P16050 1/20 0.69
KMT2A Q03164 8/20 0.61
MEN1 O00255 5/20 0.61
LMNA P02545 3/20 0.61
POLB P06746 2/20 0.61
PKM P14618 1/20 0.61
APEX1 P27695 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
ALDH1A1 P00352 4/20 0.58
KDM4E B2RXH2 2/20 0.58
CYP1A2 P05177 2/20 0.58
HDAC3 O15379 1/20 0.56
EPHA2 P29317 1/20 0.56
HDAC4 P56524 1/20 0.56
HDAC1 Q13547 1/20 0.56
HDAC7 Q8WUI4 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9475030 0.93 KMT2A (0.71) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL9474590 0.93 KMT2A (0.71) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL6816201 0.91 RAB9A (0.83) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL11462217 0.91 RAB9A (0.83) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL12268549 0.89 NPC1 (0.61) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL8827394 0.87 PRSS1 (0.64) SMN1; SMN2KMT2ALMNAPKMTDP1
SCHEMBL9574890 0.84 MEN1 (0.76) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL22640296 0.84 RAB9A (0.86) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL6799157 0.83 RAB9A (1.00) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL6815598 0.82 KMT2A (0.69) RAB9ANPC1SMN1; SMN2TP53ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8105663-B2 Composition for forming substrate, and prepreg and substrate using the same SAMSUNG ELECTRO-MECHANICS CO., LTD (KR) 2012-01-31 US disclosed
US-20100283004-A1 Composition For Forming Substrate, and Prepreg and Substrate Using The Same SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) 2010-11-11 US disclosed