⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2960401 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL4659758 | 0.67 | — | — | |
| SCHEMBL9148808 | 0.62 | — | — | |
| SCHEMBL23451809 | 0.59 | — | — | |
| SCHEMBL4886503 | 0.54 | — | — | |
| Trimethylammonium SCHEMBL5310222 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL13989274 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL1331060 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL5582 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL284438 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7141488-B2 | Method of depositing germanium-containing films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-28 | — | — | US | claimed |
| US-20260114191-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-04-23 | — | — | US | disclosed |
| US-20260110080-A1 | METHOD OF DEPOSITING FILM | TOKYO ELECTRON LTD (JP) | 2026-04-23 | — | — | US | disclosed |
| CN-111696851-B | Film forming method and heat treatment apparatus | 东京毅力科创株式会社 | 2024-07-09 | — | — | CN | disclosed |
| US-11239076-B2 | Film forming method and heat treatment apparatus | TOKYO ELECTRON LIMITED (JP) | 2022-02-01 | — | — | US | disclosed |
| US-11177133-B2 | Method of filling recess | TOKYO ELECTRON LIMITED (JP) | 2021-11-16 | — | — | US | disclosed |
| US-11114297-B2 | Method for forming semiconductor film and film forming device | TOKYO ELECTRON LIMITED (JP) | 2021-09-07 | — | — | US | disclosed |
| US-11062904-B2 | Method of forming polysilicon film and film forming apparatus | TOKYO ELECTRON LIMITED (JP) | 2021-07-13 | — | — | US | disclosed |
| US-10957535-B2 | Semiconductor film forming method and film forming apparatus | TOKYO ELECTRON LIMITED (JP) | 2021-03-23 | — | — | US | disclosed |
| US-10822714-B2 | Method of growing crystal in recess and processing apparatus used therefor | TOKYO ELECTRON LIMITED (JP) | 2020-11-03 | — | — | US | disclosed |
| US-20070154637-A1 | Organometallic composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-07-05 | — | — | US | disclosed |
| EP-1798307-A1 | Organometallic composition | Rohm and Haas Electronic Materials LLC (US) | 2007-06-20 | — | — | EP | disclosed |
| US-20070077733-A1 | Germanium compound delivery device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-04-05 | — | — | US | disclosed |
| US-7141488-B2 | Method of depositing germanium-containing films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-28 | — | — | US | disclosed |
| CN-1654707-A | Organometallic compounds | ROHM & HAAS ELECT MAT (US) | 2005-08-17 | — | — | CN | disclosed |
| CN-1584108-A | Organometallic compounds | ROHM & HAAS ELECT MAT (US) | 2005-02-23 | — | — | CN | disclosed |
| US-20040194703-A1 | Organometallic compounds | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2004-10-07 | — | — | US | disclosed |
| US-20040197945-A1 | Germanium compounds | ROHM AND HAAS ELECTRONIC MATERIALS L.L.C. | 2004-10-07 | — | — | US | disclosed |
| EP-1464725-A2 | Germanium compounds suitable for use in vapor deposition processes | Rohm and Haas Electronic Materials, L.L.C. (US) | 2004-10-06 | — | — | EP | disclosed |
| EP-1464724-A2 | Organometallic compounds suitable for use in vapor deposition processes | Rohm and Haas Electronic Materials, L.L.C. (US) | 2004-10-06 | — | — | EP | disclosed |