⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5048880 | 0.96 | — | — | |
| Ethylene SCHEMBL27799158 | 0.93 | — | — | |
| Benzoquinone SCHEMBL969405 | 0.57 | MAPK1 (0.53) | — | |
| SCHEMBL242032 | 0.57 | — | — | |
| SCHEMBL8958348 | 0.50 | — | — | |
| Furan SCHEMBL28897467 | 0.50 | MAPK1 (0.73) | — | |
| SCHEMBL35245 | 0.50 | — | — | |
| Furan SCHEMBL27460884 | 0.50 | — | — | |
| Furan SCHEMBL5028505 | 0.50 | — | — | |
| Furan SCHEMBL11414424 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3086 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119331130-B | Solid catalyst component for olefin polymerization, olefin polymerization catalyst and application thereof | 中国石油天然气股份有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-12624285-B2 | Etching composition, method of etching metal-containing film by using the same, and method of preparing semiconductor device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-12 | — | — | US | claimed |
| WO-2026087604-A1 | ECOBIOLOGICAL COMPOSITION COMPRISING ENVIRONMENTALLY FRIENDLY SUN PROTECTION BOOSTERS | NAOS INSTITUTE OF LIFE SCIENCE (FR) | 2026-04-30 | — | — | WO | claimed |
| US-20260096365-A1 | COMPOSITION, METHOD OF TREATING METAL-CONTAINING FILM AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-02 | — | — | US | claimed |
| US-20260055306-A1 | POLISHING LIQUID, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | RESONAC CORP (JP) | 2026-02-26 | — | — | US | claimed |
| US-20260008949-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | RESONAC CORP (JP) | 2026-01-08 | — | — | US | claimed |
| US-20260008948-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | RESONAC CORP (JP) | 2026-01-08 | — | — | US | claimed |
| US-20260002063-A1 | CMP POLISHING LIQUID, CMP POLISHING LIQUID SET, AND POLISHING METHOD | RESONAC CORP (JP) | 2026-01-01 | — | — | US | claimed |
| EP-4657504-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT PRODUCTION METHOD, AND SEMICONDUCTOR COMPONENT PRODUCTION METHOD | Resonac Corporation (JP) | 2025-12-03 | — | — | EP | claimed |
| EP-4657503-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD | Resonac Corporation (JP) | 2025-12-03 | — | — | EP | claimed |
| EP-0076088-B1 | A PHOTOCONDUCTIVE COMPOSITION AND A PHOTOCONDUCTIVE ELEMENT COMPRISING THE COMPOSITION | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1986-03-19 | — | — | EP | claimed |
| US-4518685-A | BLOCKED AGENT FOR STORAGE STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 1985-05-21 | — | — | US | claimed |
| EP-0125523-A2 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1984-11-21 | — | — | EP | claimed |
| US-4466889-A | ALIPHATIC ALPHA-HYDROXY ACIDS, BETA-KETO COMPOUNDS, 2 AND 4-PYRONES WITH ALPHA-HYDROXY GROUP | PFIZER INC. | 1984-08-21 | — | — | US | claimed |
| US-4394428-A | IMPROVED QUANTUM EFFICIENCY | EASTMAN KODAK COMPANY (US) | 1983-07-19 | — | — | US | claimed |
| EP-0076088-A2 | A photoconductive composition and a photoconductive element comprising the composition | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1983-04-06 | — | — | EP | claimed |
| EP-0073599-A1 | Polyvalent metal ion chelating agents for xanthan solutions | PFIZER INC. (US) | 1983-03-09 | — | — | EP | claimed |
| EP-0013196-B1 | PROCESS FOR THE PREPARATION OF ORGANIC ACID CHLORIDES | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-11-25 | — | — | EP | claimed |
| US-4297301-A | A 4H-PYRAN-4-ONE OR N-ALKYL-4-PYRIDONE CATALYST FOR THE PHOSGENATION OF AN ACID OR ANHYDRIDE | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1981-10-27 | — | — | US | claimed |
| US-4214963-A | Process for the preparation of substituted 4H-pyran-4-ones | Garcia de Lama, Javier (ES) | 1980-07-29 | — | — | US | claimed |