SCHEMBL10033688

SCHEMBL10033688

C=C(C)C(=O)OCC1CCC2OC12

nearest known ligand 0.51

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.51
TSHR P16473 4/20 0.37
THRB P10828 1/20 0.35
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
PPM1B O75688 1/20 0.31
PTPN1 P18031 1/20 0.31
PPP1CC P36873 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL213427 0.91 ALDH1A1 (0.49) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL12056564 0.82 ALDH1A1 (0.41) ALDH1A1
SCHEMBL18400887 0.81 ALDH1A1 (0.45) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL1469984 0.79 ALDH1A1 (0.50) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL20276136 0.79 ALDH1A1 (0.40) ALDH1A1TSHRTHRB
SCHEMBL92234 0.78 ALDH1A1 (0.49) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL15705615 0.78 ALDH1A1 (0.56) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL19619113 0.77 ALDH1A1 (0.47) ALDH1A1TSHRTHRBPPM1B
SCHEMBL11481185 0.75 ALDH1A1 (0.56) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL9577034 0.74 ALDH1A1 (0.70) ALDH1A1TSHRTHRBCYP3A4CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027889-A1 METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-25 US disclosed
US-11801333-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-31 US disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-11357970-B2 Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-14 US disclosed
US-11071485-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-27 US disclosed
US-10726967-B2 Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
US-20190254548-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-22 US disclosed
CN-109964328-A Composition for forming organic electroluminescent element, and method for producing organic film 三菱化学株式会社 2019-07-02 CN disclosed
CN-109661855-A Photosensitive resin composition for forming organic electroluminescent element partition wall, organic electroluminescent element, image display device, and illumination 三菱化学株式会社 2019-04-19 CN disclosed
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
EP-2023203-A1 Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device FUJIFILM Corporation (JP) 2009-02-11 EP disclosed
US-20090027608-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, AND METHOD FOR PRODUCING A PHOTOSPACER, AND SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-20090027608-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, AND METHOD FOR PRODUCING A PHOTOSPACER, AND SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-7455954-B2 Lithographic printing plate precursor and polymerizable composition FUJIFILM CORPORATION (JP) 2008-11-25 US disclosed
US-20080213550-A1 INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2008-09-04 US disclosed
US-7351773-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2008-04-01 US disclosed
US-7317055-B2 Adhesive resin and adhesive resin composition for liquid crystalline polymer MITSUI CHEMICALS, INC. (JP) 2008-01-08 US disclosed
US-7317055-B2 Adhesive resin and adhesive resin composition for liquid crystalline polymer MITSUI CHEMICALS, INC. (JP) 2008-01-08 US disclosed