⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9746099 | 0.78 | — | — | |
| SCHEMBL9812386 | 0.75 | — | — | |
| SCHEMBL2770117 | 0.71 | TSHR (0.32) | — | |
| SCHEMBL11506423 | 0.71 | — | — | |
| Trichloroacetic Acid SCHEMBL6658174 | 0.70 | — | — | |
| Trichloroacetic Acid SCHEMBL5969297 | 0.67 | ALDH1A1 (0.83) | — | |
| Trichloroacetic Acid SCHEMBL28169658 | 0.67 | ALDH1A1 (0.83) | — | |
| Methacrylic Acid SCHEMBL10936159 | 0.67 | TDP1 (0.42) | — | |
| SCHEMBL23950 | 0.67 | — | — | |
| SCHEMBL203037 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111013654-B | Graphene oxide/molecular imprinting composite material and preparation method and application thereof | 太原理工大学 | 2022-06-03 | — | — | CN | claimed |
| CN-111234295-B | Molecularly imprinted photocatalytic material and preparation method and application thereof | 太原理工大学 | 2022-06-03 | — | — | CN | claimed |
| CN-111013654-A | Graphene oxide/molecular imprinting composite material and preparation method and application thereof | 太原理工大学 | 2020-04-17 | — | — | CN | claimed |
| US-5078462-A | Process and screen for disturbing the transmission of electromagnetic radiation particularly infra-red radiation | GRAVISSE PHILIPPE E (FR) | 1992-01-07 | — | — | US | claimed |
| EP-4656669-A1 | FLUORINATED COPOLYMERS BASED ON AN OLIGO(2-OXAZOLINE) MACROMONOMER | ARKEMA FRANCE (FR) | 2025-12-03 | — | — | EP | disclosed |
| CN-111234295-B | Molecularly imprinted photocatalytic material and preparation method and application thereof | 太原理工大学 | 2022-06-03 | — | — | CN | disclosed |
| CN-111013654-B | Graphene oxide/molecular imprinting composite material and preparation method and application thereof | 太原理工大学 | 2022-06-03 | — | — | CN | disclosed |
| CN-111154035-B | Tree-shaped molecular imprinting material and preparation method and application thereof | 深圳市易瑞生物技术股份有限公司 | 2022-03-22 | — | — | CN | disclosed |
| CN-111234295-A | Molecularly imprinted photocatalytic material and preparation method and application thereof | 太原理工大学 | 2020-06-05 | — | — | CN | disclosed |
| CN-111154035-A | Tree-shaped molecular imprinting material and preparation method and application thereof | 深圳市易瑞生物技术股份有限公司 | 2020-05-15 | — | — | CN | disclosed |
| CN-111013654-A | Graphene oxide/molecular imprinting composite material and preparation method and application thereof | 太原理工大学 | 2020-04-17 | — | — | CN | disclosed |
| CN-105979973-B | Non- self-adhesive coating material | 罗塞尔工业公司 | 2019-08-23 | — | — | CN | disclosed |
| EP-0252734-B1 | X-ray reduction projection exposure system of reflection type | CANON KK (JP) | 2000-05-03 | — | — | EP | disclosed |
| EP-0947882-A2 | X-ray reduction projection exposure system of reflection type | CANON KABUSHIKI KAISHA (JP) | 1999-10-06 | — | — | EP | disclosed |
| EP-0629894-B1 | Method for domain-dividing liquid crystal alignment film and liquid crystal device using such film | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| US-5478682-A | Patterned exposure and alkaline development of a photosensitive resin covering a film aligned in one direction prior to aligning uncovered film portion in another direction | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| EP-0629894-A1 | Method for domain-dividing liquid crystal alignment film and liquid crystal device using such film | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-12-21 | — | — | EP | disclosed |
| US-5153898-A | X-ray reduction projection exposure system of reflection type | CANON KABUSHIKI KAISHA (JP) | 1992-10-06 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
| EP-0252734-A2 | X-ray reduction projection exposure system of reflection type | CANON KABUSHIKI KAISHA (JP) | 1988-01-13 | — | — | EP | disclosed |