SCHEMBL10038347

SCHEMBL10038347

O=C(O)C1=NN(c2ccc(S(=O)(=O)O)cc2)C(=O)/C1=C\C=CC=Cc1c(C(=O)O)nn(-c2ccc(S(=O)(=O)O)cc2)c1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP2 O95551 1/20 0.43
▸ KAT8 Q9H7Z6 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ ALDH1A1 P00352 6/20 0.35
▸ HPGD P15428 1/20 0.35
▸ HSD17B10 Q99714 1/20 0.35
▸ MAPT P10636 5/20 0.32
▸ MAPK1 P28482 5/20 0.32
▸ KMT2A Q03164 5/20 0.32
▸ MEN1 O00255 3/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ L3MBTL1 Q9Y468 2/20 0.32
▸ HTT P42858 3/20 0.31
▸ POLB P06746 2/20 0.31
▸ KDM4E B2RXH2 1/20 0.31
▸ GAA P10253 1/20 0.31
▸ PKM P14618 1/20 0.31
▸ OPRK1 P41145 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6680130 1.00 TDP2 (0.43) TDP2KAT8CA1CA2CA9
SCHEMBL6680138 1.00 TDP2 (0.43) TDP2KAT8CA1CA2CA9
SCHEMBL6679279 0.99 TDP2 (0.43) TDP2KAT8CA1CA2CA9
SCHEMBL6679289 0.99 TDP2 (0.43) TDP2KAT8CA1CA2CA9
SCHEMBL13528771 0.96 TDP2 (0.41) TDP2KAT8CA1CA2CA9
SCHEMBL9180471 0.96 TDP2 (0.45) TDP2KAT8CA1CA2CA9
SCHEMBL3184820 0.96 TDP2 (0.45) TDP2KAT8CA1CA2CA9
SCHEMBL6679067 0.96 TDP2 (0.45) TDP2KAT8CA1CA2CA9
SCHEMBL7049522 0.96 TDP2 (0.45) TDP2KAT8CA1CA2CA9
SCHEMBL14207867 0.96 TDP2 (0.45) TDP2KAT8CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8097143-B2 Plating method, light-transmitting electrically-conductive film and light-transmitting electromagnetic wave shield film FUJIFILM CORPORATION (JP) 2012-01-17 — — US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 — — US disclosed
US-7829270-B2 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel FUJIFILM CORPORATION (JP) 2010-11-09 — — US disclosed
US-20090098480-A1 PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2009-04-16 — — US disclosed
US-20090098481-A1 PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2009-04-16 — — US disclosed
US-20090065364-A1 Plating method, light-transmitting electrically-conductive film and light-transmitting electromagnetic wave shield film FUJIFILM CORPORATION (JP) 2009-03-12 — — US disclosed
US-20090029125-A1 PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2009-01-29 — — US disclosed
US-20090017277-A1 comprising a support; and an emulsion layer containing a silver salt emulsion, the photosensitive material being capable of forming a conductive metal film by exposing and developing the emulsion layer, wherein the emulsion layer has a swelling rate of 150% or more FUJIFILM CORPORATION (JP) 2009-01-15 — — US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 — — US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 — — US disclosed
US-7229738-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-06-12 — — US disclosed
US-7229738-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-06-12 — — US disclosed
US-7210865-B2 Automatic developing apparatus and process for forming image using the same FUJIFILM CORPORATION (JP) 2007-05-01 — — US disclosed
US-7210865-B2 Automatic developing apparatus and process for forming image using the same FUJIFILM CORPORATION (JP) 2007-05-01 — — US disclosed
US-7172855-B2 Silver halide photographic light-sensitive material and package thereof FUJI PHOTO FILM CO., LTD. (JP) 2007-02-06 — — US disclosed
US-7172855-B2 Silver halide photographic light-sensitive material and package thereof FUJI PHOTO FILM CO., LTD. (JP) 2007-02-06 — — US disclosed
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