SCHEMBL1003953

SCHEMBL1003953

N#CCCCCCCCCCCCC#N

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
TDP1 Q9NUW8 1/20 0.58
TSHR P16473 3/20 0.56
MAPT P10636 1/20 0.46
LOX P28300 1/20 0.44
LOXL3 P58215 1/20 0.44
LOXL2 Q9Y4K0 1/20 0.44
CYP3A4 P08684 1/20 0.44
HIF1A Q16665 2/20 0.35
EPAS1 Q99814 2/20 0.35
GBA1 P04062 1/20 0.35
PKM P14618 1/20 0.35
LCK P06239 1/20 0.33
NLRP3 Q96P20 1/20 0.33
TBXAS1 P24557 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14740533 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL1003032 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL411130 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL818935 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL1004438 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL1003333 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL5203287 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL1004069 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL645518 1.00 ALDH1A1 (0.58) ALDH1A1TDP1TSHRMAPTLOX
SCHEMBL818520 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230390743-A1 CATALYST FOR PRODUCING DIBASIC AMINE BY HYDROGENATION OF DIBASIC NITRILE, A PROCESS FOR PREPARING THE SAME AND USE THEREOF CHINA PETROLEUM & CHEMICAL CORPORATION (CN) 2023-12-07 US claimed
EP-4238651-A1 CATALYST FOR PREPARING DIAMINE BY HYDROGENATION OF DINITRILE, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF China Petroleum & Chemical Corporation (CN) 2023-09-06 EP claimed
CN-119303584-A Preparation method and continuous production device of long-chain diamine 上海凯赛生物技术股份有限公司 2025-01-14 CN disclosed
CN-119306614-A Preparation method of diamine 上海凯赛生物技术股份有限公司 2025-01-14 CN disclosed
US-20240372143-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM ION BATTERY CONTAINING SAME ZHANGJIAGANG GUOTAI-HUARONG NEW CHEMICAL MATERIALS CO., LTD. (CN) 2024-11-07 US disclosed
EP-4456243-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM ION BATTERY CONTAINING SAME Zhangjiagang Guotai-Huarong New Chemical Materials Co., Ltd (CN) 2024-10-30 EP disclosed
US-20230390743-A1 CATALYST FOR PRODUCING DIBASIC AMINE BY HYDROGENATION OF DIBASIC NITRILE, A PROCESS FOR PREPARING THE SAME AND USE THEREOF CHINA PETROLEUM & CHEMICAL CORPORATION (CN) 2023-12-07 US disclosed
EP-4238651-A1 CATALYST FOR PREPARING DIAMINE BY HYDROGENATION OF DINITRILE, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF China Petroleum & Chemical Corporation (CN) 2023-09-06 EP disclosed
WO-2022089487-A1 CATALYST FOR PREPARING DIAMINE BY HYDROGENATION OF DINITRILE, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 中国石油化工股份有限公司 2022-05-05 WO disclosed
EP-2772981-B1 NON-AQUEOUS SECONDARY BATTERY ASAHI CHEMICAL IND (JP) 2020-10-21 EP disclosed
CN-111393303-A Novel preparation process and device for diamine 青岛俪徕精细化工有限公司 2020-07-10 CN disclosed
US-20090130849-A1 CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE EKC TECHNOLOGY, INC. 2009-05-21 US disclosed
WO-2009058274-A1 CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058275-A1 METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058288-A1 AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058272-A1 COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058278-A1 METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS EKC TECHNOLOGY, INC (US) 2009-05-07 WO disclosed
US-20090107520-A1 AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES EKC TECHNOLOGY, INC. 2009-04-30 US disclosed
US-4389333-A Bisguanamine DEGUSSA AKTIENGESELLSCHAFT (DE) 1983-06-21 US disclosed
US-4339578-A STABILIZERS FOR FORMALDEHYDE DEGUSSA AKTIENGESELLSCHAFT (DE) 1982-07-13 US disclosed