⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10040426 | 0.89 | — | — | |
| SCHEMBL10040428 | 0.87 | DPP8 (0.34) | — | |
| SCHEMBL15396581 | 0.85 | — | — | |
| SCHEMBL10040429 | 0.84 | — | — | |
| SCHEMBL14226148 | 0.84 | — | — | |
| SCHEMBL15043161 | 0.83 | — | — | |
| SCHEMBL15745523 | 0.82 | — | — | |
| SCHEMBL10040431 | 0.78 | DPP8 (0.33) | — | |
| SCHEMBL10260328 | 0.77 | EPHX2 (0.30) | — | |
| SCHEMBL14802429 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8440386-B2 | Patterning process, resist composition, and acetal compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20120009527-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |