Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.53 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.46 |
| ▸ | RAD52 | P43351 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | FAAH | O00519 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 6/20 | 0.44 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.44 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.44 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10141469 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL10141464 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL12858360 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL2681108 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL10349281 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL2680512 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL17151524 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL10141466 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL10050676 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 | |
| SCHEMBL12083081 | 1.00 | NAAA (0.53) | NAAAEPHX1TSHRHCAR2RAD52 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180196178-A1 | RESIN FILM, COLORING PHOTOSENSITIVE COMPOSITION, RESIN FILM PRODUCTION METHOD, COLOR FILTER, LIGHT SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2018-07-12 | — | — | US | disclosed |
| US-20180175299-A1 | ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN FILM TRANSISTOR, ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC SEMICONDUCTOR FILM, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR FILM | FUJIFILM CORPORATION (JP) | 2018-06-21 | — | — | US | disclosed |
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180030175-A1 | POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-20170351179-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170329219-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9798235-B2 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-20130177850-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-11 | — | — | US | disclosed |
| US-8426109-B2 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120288691-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20120052444-A1 | POLYMERIZABLE COMPOSITION, AND LITHOGRAPHIC PRINTING PLATE PRECURSOR, ANTIFOULING MEMBER AND ANTIFOGGING MEMBER EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120052442-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120015293-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110244270-A1 | BINDER COMPOSITION FOR MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-7863218-B2 | Coating composition for producing heat-sensitive transfer image-receiving sheet and heat-sensitive transfer image-receiving sheet | FUJIFILM CORPORATION (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20070202275-A1 | Coating composition for producing heat-sensitive transfer image-receiving sheet and heat-sensitive transfer image-receiving sheet | FUJIFILM CORPORATION (JP) | 2007-08-30 | — | — | US | disclosed |
| US-20070081062-A1 | Ink set and inkjet image recording method | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |