Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Trifluoromethanesulfonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL9316346 | 0.96 | ALDH1A1 (0.45) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL39465 | 0.96 | ALDH1A1 (0.50) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL295 | 0.96 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3950101 | 0.96 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3507077 | 0.96 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25293988 | 0.92 | ALDH1A1 (0.47) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL23094034 | 0.92 | ALDH1A1 (0.47) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25287607 | 0.92 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL8065306 | 0.92 | ALDH1A1 (0.47) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL25292879 | 0.92 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040259814-A1 | Synthesis of solanum glycosides | GLYCOMED SCIENCES LIMITED (KY) | 2004-12-23 | — | — | US | claimed |
| CN-118056486-A | Material for electronic devices | 默克专利有限公司 | 2024-05-17 | — | — | CN | disclosed |
| CN-117255779-A | Bisdiaminophenyl compound, crosslinking agent, composition and molded article | 大金工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| WO-2023052272-A1 | MATERIALS FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2023-04-06 | — | — | WO | disclosed |
| WO-2023052275-A1 | MATERIALS FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2023-04-06 | — | — | WO | disclosed |
| WO-2023052314-A1 | MATERIALS FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2023-04-06 | — | — | WO | disclosed |
| WO-2022230706-A1 | BISDIAMINOPHENYL COMPOUND, CROSSLINKING AGENT, COMPOSITION, AND MOLDED ARTICLE | ダイキン工業株式会社 | 2022-11-03 | — | — | WO | disclosed |
| CN-108623506-A | Sulfonium salt, anti-corrosion agent composition and pattern forming method | 信越化学工业株式会社 | 2018-10-09 | — | — | CN | disclosed |
| CN-107848983-A | Compound, resin, lower layer film for lithography form material, lower layer film for lithography is formed with composition, lower layer film for lithography and corrosion-resisting pattern forming method, circuit pattern forming method and purification process | 三菱瓦斯化学株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-107428646-A | Compound, resin and their purification process, lower floor's film formation material of photoetching, lower membrane formation with composition and lower membrane and, corrosion-resisting pattern forming method and circuit pattern forming method | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| EP-2524911-A1 | METHOD FOR PRODUCING 3,4-DISUBSTITUTED PYRROLIDINE DERIVATIVE AND PRODUCTION INTERMEDIATE THEREOF | Kyorin Pharmaceutical Co., Ltd. (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120283448-A1 | METHOD FOR PRODUCING 3,4-DISUBSTITUTED PYRROLIDINE DERIVATIVE AND PRODUCTION INTERMEDIATE THEREOF | KYORIN PHARMACEUTICAL CO., LTD. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20110033716-A1 | GAS-BARRIER COMPOSITION, COATING FILM, PROCESS FOR PRODUCING THE SAME, AND LAYERED MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-7879947-B2 | Gas-barrier composition, coating film and method for production of the same, and layered material | MITSUI CHEMICALS, INC. (JP) | 2011-02-01 | — | — | US | disclosed |
| EP-2277954-A1 | GAS BARRIER COMPOSITION, COATING FILM, METHOD FOR PRODUCING THE GAS BARRIER COMPOSITION, METHOD FOR PRODUCING THE COATING FILM, AND MULTILAYER BODY | Mitsui Chemicals, Inc. (JP) | 2011-01-26 | — | — | EP | disclosed |
| US-20090171003-A1 | Gas-barrier composition, coating film and method for production of the same, and layered material | MITSUI CHEMICALS, INC. (JP) | 2009-07-02 | — | — | US | disclosed |
| US-7524900-B2 | Gas-barrier composition, coating film and method for production of the same, and layered material | MITSUI CHEMICALS, INC. (JP) | 2009-04-28 | — | — | US | disclosed |
| EP-1894971-A1 | GAS BARRIER COMPOSITION, COATING FILM, METHODS FOR PRODUCING THOSE, AND MULTILAYER BODY | Mitsui Chemicals, Inc. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-20060293448-A1 | Gas-barrier composition, coating film and method for production of the same, and layered material | MITSUI CHEMICALS, INC. (JP) | 2006-12-28 | — | — | US | disclosed |
| US-4238423-A | ACIDOLYSIS OF AN ALPHA-ARYLALKYL GROUP | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1980-12-09 | — | — | US | disclosed |