⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL9934060 | 1.00 | TSHR (0.56) | — | |
| Trimethylammonium SCHEMBL28134710 | 0.95 | — | — | |
| Trimethylammonium SCHEMBL28158661 | 0.95 | — | — | |
| Trimethylammonium SCHEMBL11151838 | 0.95 | — | — | |
| Ethylene Glycol SCHEMBL28159568 | 0.82 | — | — | |
| 1,4-Butanediol SCHEMBL27608420 | 0.80 | SMN1; SMN2 (0.53) | — | |
| Propanol SCHEMBL4232952 | 0.80 | — | — | |
| 1,3-Propanediol SCHEMBL9777722 | 0.80 | — | — | |
| Trimethylammonium SCHEMBL27801498 | 0.78 | ALDH1A1 (0.67) | — | |
| Trimethylammonium SCHEMBL2439226 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 890 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12516191-B2 | Isocyanurate-containing polyisocyanate composition with stable chromaticity, and preparation method thereof | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2026-01-06 | — | — | US | claimed |
| US-12312569-B2 | Kit for cleaning agent and method for preparing cleaning agent | FUJIFILM CORPORATION (JP) | 2025-05-27 | — | — | US | claimed |
| CN-119013768-A | Etching composition | 富士胶片电子材料美国有限公司 | 2024-11-22 | — | — | CN | claimed |
| CN-118994585-A | High-refractive-index fluorosilicone liquid and preparation method thereof | 深圳市冠恒新材料科技有限公司 | 2024-11-22 | — | — | CN | claimed |
| CN-114672378-B | Alkaline cleaning composition, cleaning method and semiconductor manufacturing method | 达兴材料股份有限公司 | 2024-08-13 | — | — | CN | claimed |
| CN-118421414-A | Post-CMP cleaning composition and method for cleaning semiconductor device substrate | 武汉鼎泽新材料技术有限公司 | 2024-08-02 | — | — | CN | claimed |
| CN-118126783-A | Tungsten process cleaning agent for removing residues after dry etching by one-step method | 深圳迪道微电子科技有限公司 | 2024-06-04 | — | — | CN | claimed |
| CN-111758149-B | Treatment liquid and treatment method | 株式会社东芝 | 2024-05-03 | — | — | CN | claimed |
| CN-117946812-A | Cleaning composition | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-117761977-A | Corrosion-resistant alkaline developer | 国科天骥(滨州)新材料有限责任公司 | 2024-03-26 | — | — | CN | claimed |
| EP-1579033-A4 | METAL CORROSION INHIBITOR AND HYDROGEN CHLORIDE FORMATION INHIBITOR IN A CRUDE OIL ATMOSPHERIC DISTILLATION UNIT | KURITA WATER IND LTD (JP) | 2007-11-21 | — | — | EP | claimed |
| CN-1754898-A | Polyester manufacture method | ZIMMER AG (DE) | 2006-04-05 | — | — | CN | claimed |
| CN-1723297-A | Metal corrosion inhibitor and hydrogen chloride formation inhibitor in crude oil atmospheric distillation unit | KURITA WATER IND LTD (JP) | 2006-01-18 | — | — | CN | claimed |
| US-20060003134-A1 | AlxGayIn1-x-yN substrate, cleaning method of AlxGayIn1-x-yN substrate, AIN substrate, and cleaning method of AIN substrate | SUMITOMO ELECTRIC INDUSTRIES, LTD. | 2006-01-05 | — | — | US | claimed |
| US-20050266683-A1 | Remover compositions for dual damascene system | EKC TECHNOLOGY INC. | 2005-12-01 | — | — | US | claimed |
| EP-1579033-A1 | METAL CORROSION INHIBITOR AND HYDROGEN CHLORIDE FORMATION INHIBITOR IN A CRUDE OIL ATMOSPHERIC DISTILLATION UNIT | Kurita Water Industries Ltd. (JP) | 2005-09-28 | — | — | EP | claimed |
| CN-1607268-A | Method for isotropic etching of copper | IBM (US) | 2005-04-20 | — | — | CN | claimed |
| WO-2004044266-A1 | METAL CORROSION INHIBITOR AND HYDROGEN CHLORIDE FORMATION INHIBITOR IN A CRUDE OIL ATMOSPHERIC DISTILLATION UNIT | KURITA WATER INDUSTRIES LTD. (JP) | 2004-05-27 | — | — | WO | claimed |
| CN-1109273-C | Developer for photoresist layers | CLARIANT GMBH (DE) | 2003-05-21 | — | — | CN | claimed |
| CN-1117599-A | Developer for photoresist layers | HOECHST AG (DE) | 1996-02-28 | — | — | CN | claimed |