⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1784273 | 1.00 | — | — | |
| SCHEMBL1784274 | 1.00 | — | — | |
| SCHEMBL11289249 | 0.82 | OXER1 (0.32) | — | |
| SCHEMBL1759158 | 0.80 | — | — | |
| SCHEMBL6722495 | 0.80 | — | — | |
| SCHEMBL6722499 | 0.80 | — | — | |
| SCHEMBL2917720 | 0.80 | — | — | |
| SCHEMBL1759157 | 0.80 | — | — | |
| SCHEMBL6719039 | 0.78 | — | — | |
| SCHEMBL6719031 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9711729-B2 | Organic electronic element comprising fullerene derivative | LG CHEM, LTD. (KR) | 2017-07-18 | — | — | US | disclosed |
| US-20160087213-A1 | ORGANIC ELECTRONIC ELEMENT COMPRISING FULLERENE DERIVATIVE | LG CHEM, LTD. (KR) | 2016-03-24 | — | — | US | disclosed |
| US-9076738-B2 | Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20120045900-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-23 | — | — | US | disclosed |