SCHEMBL10064124

SCHEMBL10064124

CCC(C)(C)C(=O)Oc1ccc(C(=O)OC(C)(C)C)cc1

nearest known ligand 0.55

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 15/20 0.55
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
MAPT P10636 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39
ESR1 P03372 1/20 0.39
RECQL P46063 1/20 0.39
KMT2A Q03164 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HIF1A Q16665 1/20 0.39
PRTN3 P24158 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14827406 0.89 ELANE (0.54) ELANEMAPTTDP1L3MBTL1CYP1A2
SCHEMBL1104226 0.86 ELANE (0.56) ELANECA12CA1CA2CA9
SCHEMBL1104189 0.84 CA12 (0.57) ELANECA12CA1CA2CA9
SCHEMBL9880583 0.84 ELANE (0.60) ELANECA2KMT2A
SCHEMBL25468064 0.83 ELANE (0.48) ELANEMAPTTDP1L3MBTL1CYP1A2
SCHEMBL825366 0.83 MAPT (0.56) ELANEMAPTTDP1L3MBTL1KMT2A
SCHEMBL21208347 0.82 ELANE (0.47) ELANEMAPTTDP1L3MBTL1CYP1A2
SCHEMBL17853773 0.82 ELANE (0.47) ELANEMAPTTDP1L3MBTL1CYP1A2
SCHEMBL11964033 0.82 ELANE (0.59) ELANECA1CA2
SCHEMBL6744127 0.82 ELANE (0.59) ELANEMAPTL3MBTL1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed