Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGR | P06401 | 1/20 | 0.37 |
| ▸ | HCRTR2 | O43614 | 3/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | CNR1 | P21554 | 2/20 | 0.33 |
| ▸ | CNR2 | P34972 | 2/20 | 0.33 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17052462 | 0.85 | SMYD3 (0.36) | HCRTR2EPHX1CNR1CNR2POLB | |
| SCHEMBL13219591 | 0.85 | HCRTR2 (0.35) | PGRHCRTR2EPHX1CNR1CNR2 | |
| SCHEMBL3434648 | 0.79 | EPHX1 (0.37) | EPHX1 | |
| SCHEMBL18199014 | 0.78 | CHRM3 (0.33) | EPHX1 | |
| SCHEMBL13219579 | 0.77 | EPHX1 (0.40) | EPHX1CNR1CNR2POLB | |
| SCHEMBL15132160 | 0.76 | HCRTR2 (0.32) | HCRTR2 | |
| SCHEMBL13219576 | 0.76 | EPHX1 (0.32) | EPHX1 | |
| SCHEMBL16575867 | 0.75 | APOBEC3A (0.36) | HCRTR2EPHX1 | |
| SCHEMBL2298679 | 0.75 | PGR (0.38) | PGRHCRTR2EPHX1CNR1CNR2 | |
| SCHEMBL17052466 | 0.74 | MLNR (0.32) | EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9422445-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-08-23 | — | — | US | disclosed |
| US-9223217-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-12-29 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20110207051-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | US | disclosed |