Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.34 |
| ▸ | HMGCR | P04035 | 3/20 | 0.34 |
| ▸ | USP2 | O75604 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | SLCO1B1 | Q9Y6L6 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.34 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.34 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.34 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.34 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.34 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.34 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.34 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10015628 | 0.91 | CYP3A4 (0.34) | CYP3A4HMGCRUSP2ALDH1A1TSHR | |
| SCHEMBL16744068 | 0.89 | — | — | |
| SCHEMBL8798340 | 0.85 | — | — | |
| SCHEMBL12866044 | 0.83 | CHRM2 (0.35) | CHRM1PPP5C | |
| SCHEMBL15726650 | 0.81 | PPM1B (0.40) | CYP3A4HMGCRUSP2ALDH1A1TSHR | |
| SCHEMBL24401047 | 0.81 | LMNA (0.34) | CYP3A4TSHRCHRM1PPP5C | |
| SCHEMBL12196930 | 0.81 | PPP5C (0.34) | PPP5C | |
| SCHEMBL13019005 | 0.79 | — | — | |
| SCHEMBL13563611 | 0.79 | PPP5C (0.32) | CYP3A4HMGCRUSP2ALDH1A1TSHR | |
| SCHEMBL47531 | 0.78 | HMGCR (0.35) | CYP3A4HMGCRUSP2ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20230137472-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-9316909-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-9261785-B2 | Polymer compound, resin composition for photoresists, and method for producing semiconductor | DAICEL CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9261785-B2 | Polymer compound, resin composition for photoresists, and method for producing semiconductor | DAICEL CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20150168831-A1 | POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR | DAICEL CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150168831-A1 | POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR | DAICEL CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150147696-A1 | METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTORESIST RESIN COMPOSITION | DAICEL CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20120009529-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |