SCHEMBL10066948

SCHEMBL10066948

CC(C)c1ccc(C2CC=NN2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.41
HTR1D P28221 1/20 0.36
HTR1B P28222 1/20 0.36
ALDH1A1 P00352 4/20 0.36
NISCH Q9Y2I1 1/20 0.35
TNKS2 Q9H2K2 2/20 0.34
TNKS O95271 1/20 0.34
PARP3 Q9Y6F1 1/20 0.34
CHRNA7 P36544 2/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA4 P43681 1/20 0.33
TMEM97 Q5BJF2 1/20 0.33
NPC1 O15118 1/20 0.33
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9380997 0.81 MEN1 (0.40) HPGDALDH1A1HTTTDP1NPC1
SCHEMBL9377686 0.77 CA1 (0.40) ALDH1A1TDP1ATM
SCHEMBL31211694 0.77 CA1 (0.40) ALDH1A1TDP1ATM
SCHEMBL9379626 0.77 ESR2 (0.38) HPGDALDH1A1NPC1RAB9ALMNA
SCHEMBL9378606 0.76 KDM1A (0.42) HPGDALDH1A1HTTTDP1RAB9A
SCHEMBL1178805 0.76 MEN1 (0.38) NPC1SMN1; SMN2MEN1KMT2A
SCHEMBL18255146 0.73 SLC6A2 (0.41) IDO1MEN1KMT2A
SCHEMBL30952126 0.73 CHRNB2 (0.44) HPGDALDH1A1CHRNA7TDP1CHRNB2
SCHEMBL10141182 0.72 HPGD (0.46) HPGDALDH1A1NISCHTNKS2TNKS
SCHEMBL22918217 0.71 HPGD (0.44) HPGDHTR1DHTR1BALDH1A1NISCH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107077068-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board 日立化成株式会社 2017-08-18 CN disclosed
CN-103339568-A Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2013-10-02 CN disclosed
CN-103221887-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2013-07-24 CN disclosed
WO-2012006203-A1 N-CYCLYL-3 - (CYCLYLCARBONYLAMINOMETHYL) BENZAMIDE DERIVATIVES AS RHO KINASE INHIBITORS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2012-01-12 WO disclosed