⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27861394 | 0.97 | — | — | |
| SCHEMBL27355797 | 0.83 | — | — | |
| SCHEMBL926581 | 0.83 | — | — | |
| SCHEMBL10071596 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL10600098 | 0.79 | TSHR (0.39) | — | |
| SCHEMBL10570733 | 0.79 | — | — | |
| SCHEMBL10071593 | 0.79 | DNM1 (0.43) | — | |
| SCHEMBL19036631 | 0.79 | — | — | |
| SCHEMBL4407232 | 0.78 | — | — | |
| SCHEMBL22923004 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119081357-A | High-strength flame-retardant epoxy resin composition suitable for HP-RTM technology and preparation method thereof | 四川东树新材料有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-115505239-B | Preparation method of polysiloxane modified epoxy resin material | 山东大学 | 2024-06-25 | — | — | CN | claimed |
| CN-115746823-B | Epoxy resin-based composite propping agent and preparation method thereof | 中国石油天然气集团有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-117700744-A | Polysilsesquioxane and photopolymer holographic recording medium containing same | 中国科学院理化技术研究所 | 2024-03-15 | — | — | CN | claimed |
| CN-116162326-A | HP-RTM process epoxy resin system material and preparation method thereof | 道生天合材料科技(上海)股份有限公司 | 2023-05-26 | — | — | CN | claimed |
| CN-115926379-A | Non-covalent modified boron nitride/epoxy resin heat-conducting and insulating composite material and preparation method thereof | 江南大学 | 2023-04-07 | — | — | CN | claimed |
| CN-115746823-A | Epoxy resin-based composite proppant and preparation method thereof | 中国石油天然气集团有限公司 | 2023-03-07 | — | — | CN | claimed |
| CN-115505239-A | Preparation method of polysiloxane modified epoxy resin material | 山东大学 | 2022-12-23 | — | — | CN | claimed |
| CN-114752018-A | Preparation method of UV resin with rapid curing and low shrinkage | 深圳市泓和顺科技有限公司 | 2022-07-15 | — | — | CN | claimed |
| CN-114685725-A | Aminated carbon nanotube/bismaleimide resin composite material and preparation method thereof | 洛阳尖端技术研究院 | 2022-07-01 | — | — | CN | claimed |
| CN-101250326-A | Method for preparing carbon nano-tube reinforced bismaleimide resin composite material | UNIV TONGJI (CN) | 2008-08-27 | — | — | CN | claimed |
| CN-101230211-A | Method for preparing small-molecule imide modified carbon nano-tube | UNIV TONGJI (CN) | 2008-07-30 | — | — | CN | claimed |
| CN-101195709-A | Method for producing high decentrality amido carbon nano-tube/nylon 66 composite material | UNIV TONGJI (CN) | 2008-06-11 | — | — | CN | claimed |
| CN-101104726-A | Preparation method for carbon nano-tube/epoxy resin high-performance composite material | UNIV TONGJI (CN) | 2008-01-16 | — | — | CN | claimed |
| CN-101104725-A | Preparation method for high-performance epoxy resin composite material | UNIV TONGJI (CN) | 2008-01-16 | — | — | CN | claimed |
| CN-1229691-C | Photopolymer holographic storage material consisting of high-refractive-index epoxy resin and low-refractive-index vinyl monomer and preparation method thereof | CHINESE ACAD TECH INST PHYSICS (CN) | 2005-11-30 | — | — | CN | claimed |
| CN-1651542-A | Epoxy resin binding agent for sand paper and its preparation method | UNIV WUHAN TECH (CN) | 2005-08-10 | — | — | CN | claimed |
| CN-1163560-C | Durably anticorrosion paint and its preparing process | 中国科学院长春应用化学研究所 | 2004-08-25 | — | — | CN | claimed |
| CN-1504828-A | Photopolymer holographic storage material consisting of high-refractive-index epoxy resin and low-refractive-index vinyl monomer and preparation method thereof | 中国科学院理化技术研究所 | 2004-06-16 | — | — | CN | claimed |
| CN-1306052-A | Durably anticorrosion paint and its preparing process | CHANGCHUN APPLIED CHEMISTRY (CN) | 2001-08-01 | — | — | CN | claimed |