SCHEMBL10083142

SCHEMBL10083142

C=C(C)C(=O)OC1(C(C)C)CCCCC1C1CO1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13456200 0.88 ALDH1A1 (0.34) ALDH1A1
SCHEMBL10083143 0.82
SCHEMBL29104589 0.78 TSHR (0.31)
SCHEMBL4400966 0.77 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14136148 0.76 ALDH1A1 (0.37) ALDH1A1
SCHEMBL20384184 0.76 ALDH1A1 (0.34) ALDH1A1
SCHEMBL4399276 0.75 TSHR (0.33) ALDH1A1
SCHEMBL20382245 0.74 TSHR (0.31)
SCHEMBL4403869 0.74 TSHR (0.31)
SCHEMBL10083140 0.73 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173352-B2 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-08 US disclosed
US-20080166660-A1 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-07-10 US disclosed